Magnetic Materials, Processes, and Devices 9
Magnetic Materials, Processes, and Devices 9

Author:

Publisher: The Electrochemical Society

Published: 2007

Total Pages: 444

ISBN-13: 1566775604

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This issue documents the state of the field in magnetic thin film processing using electrochemical methods including film nucleation and growth, structure of deposits, stress and micromagnetics of films, thermal and magnetic annealing, electrochemical and electroless plating systems, etching, process chemistry, tool design, and process control.

Magnetic Materials, Processes, and Devices 10
Magnetic Materials, Processes, and Devices 10

Author: S. Krongelb

Publisher: The Electrochemical Society

Published: 2009-05

Total Pages: 318

ISBN-13: 1566777305

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This issue of ECS Transactions brings together the work of electrochemists, physicists, engineers, and device designers working in the area of magnetic thin-film technology. Topics include electrochemical and electroless plating systems, etching, process chemistry, tool design, process control, film nucleation and growth, structure of deposits, stress, physics and micromagnetics of films, thermal and magnetic annealing. Applications include the fabrication of data recording systems, sensors, microelectrochemical systems (MEMS) and other magnetic devices.

Magnetic Materials Processes and Devices 11
Magnetic Materials Processes and Devices 11

Author: S. Krongelb

Publisher: The Electrochemical Society

Published: 2011-03

Total Pages: 127

ISBN-13: 1566778921

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The Eleventh International Symposium on Magnetic Materials, Processes and Devices was held on Monday and Tuesday, October 11 and 12, 2010 as part of the 218th Meeting of Electrochemical Society in Las Vegas, Nevada. This international Symposium included presentations by 59 authors and co-authors from Canada, Germany, Italy, Japan, Korea, Norway and the United States.

Morphological Evolution of Electrodeposits and Electrochemical Processing in ULSI Fabrication and Electrodeposition of and on Semiconductors IV
Morphological Evolution of Electrodeposits and Electrochemical Processing in ULSI Fabrication and Electrodeposition of and on Semiconductors IV

Author: Kazuo Kondo

Publisher: The Electrochemical Society

Published: 2005

Total Pages: 422

ISBN-13:

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Papers in this volume are from the 199th ECS Meeting, held in Washington, DC, Spring 2001. Morphology evolution encompasses electrochemical processing in ULSI fabrication, shape evolution, growth habit, and microstructure of electrodeposits. The most prominent example at present is the electrochemical deposition of copper for ULSI interconnects. Many other electrochemical processes at various stages of emergence and development hold promise for the electronics industry and beyond.