VPAD '93
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Published: 1993
Total Pages:
ISBN-13: 9780780313392
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Published: 1993
Total Pages: 0
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Publisher: Business Center for Academic Societies
Published: 1993
Total Pages: 202
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Publisher: Institute of Electrical & Electronics Engineers(IEEE)
Published: 1993
Total Pages: 404
ISBN-13:
DOWNLOAD EBOOKAuthor: Kunihiro Asada
Publisher:
Published: 1994
Total Pages: 164
ISBN-13:
DOWNLOAD EBOOKAuthor: G. R. Srinivasan
Publisher: The Electrochemical Society
Published: 1996
Total Pages: 546
ISBN-13: 9781566771542
DOWNLOAD EBOOKAuthor: J. Lorenz
Publisher: Springer Science & Business Media
Published: 2012-12-06
Total Pages: 207
ISBN-13: 3709169054
DOWNLOAD EBOOKWhereas two-dimensional semiconductor process simulation has achieved a certain degree of maturity, three-dimensional process simulation is a newly emerging field in which most efforts are dedicated to necessary basic developments. Research in this area is promoted by the growing demand to obtain reliable information on device geometries and dopant distributions needed for three-dimensional device simulation, and challenged by the great algorithmic problems caused by moving interfaces and by the requirement to limit computation times and memory requirements. A workshop (Erlangen, September 5, 1995) provided a forum to discuss the industrial needs, technical problems, and solutions being developed in the field of three-dimensional semiconductor process simulation. Invited presentations from leading semiconductor companies and research Centers of Excellence from Japan, the USA, and Europe outlined novel numerical algorithms, physical models, and applications in this rapidly emerging field.
Author: Siegfried Selberherr
Publisher: Springer
Published: 1993
Total Pages: 532
ISBN-13: 9780387825045
DOWNLOAD EBOOKAuthor: Kunihiro Asada
Publisher:
Published: 1994
Total Pages: 164
ISBN-13:
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