Chemical Vapor Deposition of Yttrium Borium(2) Copper(3) Oxygen(x) Thin Films for Wire Applications
Chemical Vapor Deposition of Yttrium Borium(2) Copper(3) Oxygen(x) Thin Films for Wire Applications

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Published: 1991

Total Pages: 312

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The chemical vapor deposition of superconducting ytterbium barium copper oxide thin films onto continuous lengths of ceramic fiber tows has been investigated. This project couples two areas of current interest in the materials field continuous fiber coating and the deposition of one of the unique high temperature superconducting oxides. The YBa2Cu3Ox material has zero resistance at temperatures above 77 K (the boiling point of nitrogen), and the film form has been shown to have high critical current densities. By coating ceramic fiber tows, a strong, flexible superconducting material in the form of wire can be developed and used for several applications, including coils for magnets and transmission lines. Over 900 deposition runs were completed using a horizontal CVD furnace and over 150 continuous fiber coating experiments were completed. The deposition was performed on fiber tows, flat samples, and flexible tapes; the continuous substrates were moved and held stationary in the furnace.

Single Liquid Source Plasma Enhanced Metalorganic Chemical Vapor Deposition of YBa2Cu3O7-x Thin Films
Single Liquid Source Plasma Enhanced Metalorganic Chemical Vapor Deposition of YBa2Cu3O7-x Thin Films

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Published: 1992

Total Pages: 13

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High quality YBa2Cu3O7-x films were grown in-situ on LaA103 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd)n, (thd = 2,2,6,6- tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 deg C. The as-deposited films exhibited a mirror-like surface, had transition temperature Tco = 89 K, Delta Tc

Aerosol Chemical Vapor Deposition of Metal Oxide Films
Aerosol Chemical Vapor Deposition of Metal Oxide Films

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Published: 1994

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A process of preparing a film of a multicomponent metal oxide including: forming an aerosol from a solution comprised of a suitable solvent and at least two precursor compounds capable of volatilizing at temperatures lower than the decomposition temperature of said precursor compounds; passing said aerosol in combination with a suitable oxygen-containing carrier gas into a heated zone, said heated zone having a temperature sufficient to evaporate the solvent and volatilize said precursor compounds; and passing said volatilized precursor compounds against the surface of a substrate, said substrate having a sufficient temperature to decompose said volatilized precursor compounds whereby metal atoms contained within said volatilized precursor compounds are deposited as a metal oxide film upon the substrate is disclosed. In addition, a coated article comprising a multicomponent metal oxide film conforming to the surface of a substrate selected from the group consisting of silicon, magnesium oxide, yttrium-stabilized zirconium oxide, sapphire, or lanthanum gallate, said multicomponent metal oxide film characterized as having a substantially uniform thickness upon said FIELD OF THE INVENTION The present invention relates to the field of film coating deposition techniques, and more particularly to the deposition of multicomponent metal oxide films by aerosol chemical vapor deposition. This invention is the result of a contract with the Department of Energy (Contract No. W-7405-ENG-36).