Current Research in Pulsed Laser Deposition

Current Research in Pulsed Laser Deposition

Author: Liviu Duta

Publisher: MDPI

Published: 2021-08-30

Total Pages: 224

ISBN-13: 3036510443

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Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.


Film Synthesis and Growth Using Energetic Beams: Volume 388

Film Synthesis and Growth Using Energetic Beams: Volume 388

Author: H. A. Atwater

Publisher:

Published: 1995-10-10

Total Pages: 472

ISBN-13:

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With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.


Deposition of Polypyrrole Thin Films by Advanced Method

Deposition of Polypyrrole Thin Films by Advanced Method

Author: Dušan Kopecký

Publisher:

Published: 2011

Total Pages: 0

ISBN-13: 9781612096230

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The development of new types of electronic devices based on conductive polymers requires precise and controlled deposition of these materials in thin layers. This book examines the latest results in research of deposition of polypyrrole (PPY) thin films by advanced method - Matrix Assisted Pulsed Laser Evaporation (MAPLE). It also provides a brief survey of the laser deposition of conductive polymers, theoretical analysis of the mechanisms of deposition by MAPLE method, definition of both source-PPY properties and deposition conditions necessary for successful thin layer fabrication.


Applications of Laser Ablation

Applications of Laser Ablation

Author: Dongfang Yang

Publisher: BoD – Books on Demand

Published: 2016-12-21

Total Pages: 430

ISBN-13: 9535128116

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Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.


Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting

Surface Modifications and Growth of Titanium Dioxide for Photo-Electrochemical Water Splitting

Author: John Alexander

Publisher: Springer

Published: 2016-05-21

Total Pages: 366

ISBN-13: 3319342290

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This outstanding thesis provides a wide-ranging overview of the growth of titanium dioxide thin films and its use in photo-electrochemicals such as water splitting. The context for water splitting is introduced with the theory of semiconductor-liquid junctions, which are dealt with in detail. In particular plasmonic enhancement of TiO2 by the addition of gold nanoparticles is considered in depth, including a thorough and critical review of the literature, which discusses the possible mechanisms that may be at work. Plasmonic enhancement is demonstrated with gold nanoparticles on Nb-doped TiO2. Finally, the use of temperature and pressure to control the phase and morphology of thin films grown by pulsed laser deposition is presented.


Chemical Vapor Deposition Polymerization

Chemical Vapor Deposition Polymerization

Author: Jeffrey B. Fortin

Publisher: Springer Science & Business Media

Published: 2013-03-09

Total Pages: 112

ISBN-13: 147573901X

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Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.


Crystalline Rare-Earth-doped Sesquioxide PLD-Films on alpha-Aluminia

Crystalline Rare-Earth-doped Sesquioxide PLD-Films on alpha-Aluminia

Author:

Publisher: Cuvillier Verlag

Published: 2004-07-28

Total Pages: 152

ISBN-13: 3736911491

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The development of integrated optical devices demands the fabrication of high-quality optically active thin films. This work focuses on thin sesquioxide films, which are promising because the sesquioxides are well-known hosts for rare-earth-ions, leading to luminescent materials and solid-state lasers with superior mechanical and thermal properties (e. g. low phonon energies, large thermal conductivity).Optical quality crystalline thin films of rare-earth-doped sesquioxides (yttria, lutetia, and scandia) have been grown by the pulsed laser deposition (PLD) technique on single-crystal (0001) a-alumina substrates. Alumina substrates offer a lattice constant that matches that of cubic Y2O3 in the á111ñ direction very well. Using Lu2O3 and Sc2O3, the mismatch of 4.8% related to Y2O3 on alumina substrates can be considerably reduced leading to the production of films with less dislocations.The crystal structure of these films (thicknesses from 1 nm to 500 nm) was determined by X-ray diffraction (XRD) and surface X-ray diffraction (SXRD) analysis. These measurements show that the films were textured along the á111ñ direction, however with a small polycrystalline component, which is negligible in thick films. Using Rutherford backscattering analysis (RBS), the correct stoichiometric composition of the films could be proved. At optimum growth conditions, epitaxial growth of Y2O3 along the á111ñ direction on the [0001] a-Al2O3 was experimentally verified by the observation of channelling in the RBS experiments.The surface morphology of the thin films has been studied using atomic force microscopy (AFM). While amorphous films have no defined surface structure, crystalline films show a triangular surface morphology, which is attributed to the á111ñ growth direction. The same structure is observed along the {111} cleavage of an yttria bulk crystal. Thin films with a mean thickness of 5 nm have no completely covered surface, but show island growth, where the shape of the single crystallites, having angles of 60° or 120° , indicates the á111ñ growth direction during the early stages of film growth.To study the optical properties of the rare-earth-doped films, spectroscopic measurements in the (vacuum-) ultraviolet and visible spectral-range have been carried out. The emission and excitation spectra of the Eu3+-doped films look similar to those of the corresponding crystalline bulk material down to a film thickness of 100 nm, i. e. the symmetry around the Eu3+-ions is preserved, whereas films with a thickness £ 20nm show a completely different emission behavior. This change can be explained by subplantation effects of high-energy plasma species hitting the substrate surface, leading to mixed compounds like Y3Al5O12. In addition, surface effects due to a large surface-to-volume ratio of the observed islands have a significant impact on the 'film' properties.For possible applications in integrated optics, waveguide experiments have been performed in the system Y2O3–Al2O3. Single-mode guiding of the fundamental mode was demonstrated in the 1 µm thick yttria layer.


Practical Applications of Laser Ablation

Practical Applications of Laser Ablation

Author: Dongfang Yang

Publisher: BoD – Books on Demand

Published: 2021-07-14

Total Pages: 174

ISBN-13: 1839683031

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Laser ablation refers to the phenomenon in which an intense laser beam irradiates the surface of a solid to induce instant local removal of atoms by a thermal or non-thermal mechanism. Through eight chapters of original research studies and literature reviews written by experts from the international scientific community, this book presents theoretical and experimental aspects of the laser ablation phenomenon for processing material including pulsed laser deposition of thin films, laser surface modification, laser machining and laser nanoparticle formation. It also includes a study of the dynamics of plasmas generated by laser ablation of multi-component materials and an overview of laser-induced breakdown spectroscopy (LIBS) and laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) techniques for chemical analysis.


Physical Vapor Deposition of Thin Films

Physical Vapor Deposition of Thin Films

Author: John E. Mahan

Publisher: Wiley-Interscience

Published: 2000-02-01

Total Pages: 0

ISBN-13: 9780471330011

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A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam


Thin Films and Heterostructures for Oxide Electronics

Thin Films and Heterostructures for Oxide Electronics

Author: Satishchandra B. Ogale

Publisher: Springer Science & Business Media

Published: 2005-07-15

Total Pages: 440

ISBN-13: 9780387258027

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Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.