Intelligent Modeling, Diagnosis and Control of Manufacturing Processes
Intelligent Modeling, Diagnosis and Control of Manufacturing Processes

Author: Bei-Tseng Bill Chu

Publisher: World Scientific Publishing Company Incorporated

Published: 1992

Total Pages: 263

ISBN-13: 9789810208172

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1. Manufacturing diagnosis and control: a task-specific approach / W.F. Punch III, A.K. Goel and J. Sticklen -- 2. The theory and application of diagnostic and control expert system based on plant model / J. Suzuki and M. Iwamasa -- 3. Integrated problem solving for the diagnosis of interacting process malfunctions / J.K. McDowell and J.F. Davis -- 4. A neural network model for diagnostic problem solving / Y. Peng and J.A. Reggia -- 5. Process control system for VLSI fabrication / E. Sachs [und weitere] -- 6. Development and application of equipment-specific process models for semiconductor manufacturing / K.-K. Lin and C. Spanos -- 7. Continuous equipment diagnosis using evidence integration - an LPCVD application / N.H. Chang, and C. Spanos -- 8. Equipment/instrument diagnosis with continuous and discrete causal relationships / B.-T.B. Chu -- 9. Intelligent control of semiconductor manufacturing processes / S.-S. Chen -- 10. A machine learning approach to diagnosis and control with applications in semiconductor manufacturing / K.B. Irani [und weitere]

Microelectronics Manufacturing Diagnostics Handbook
Microelectronics Manufacturing Diagnostics Handbook

Author: Abraham Landzberg

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 663

ISBN-13: 1461520290

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The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.

Fundamentals of Semiconductor Manufacturing and Process Control
Fundamentals of Semiconductor Manufacturing and Process Control

Author: Gary S. May

Publisher: Wiley-IEEE Press

Published: 2006-05-26

Total Pages: 428

ISBN-13: 0471790273

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A practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available.

Database Needs for Modeling and Simulation of Plasma Processing
Database Needs for Modeling and Simulation of Plasma Processing

Author: Panel on Database Needs in Plasma Processing

Publisher: National Academies Press

Published: 1996-11-04

Total Pages: 75

ISBN-13: 030957353X

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In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. "Database Needs for Modeling and Simulation of Plasma Processing" identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7
Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 7

Author: Dieter K. Schroder

Publisher: The Electrochemical Society

Published: 2007

Total Pages: 406

ISBN-13: 1566775698

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Diagnostic characterization techniques for semiconductor materials, devices and device processing are addressed at this symposium. It will cover new techniques as well as advances in routine analytical technology applied to semiconductor process development and manufacture. The hardcover edition includes a CD-ROM of ECS Transactions, Volume 10, Issue 1, Analytical Techniques for Semiconductor Materials and Process Characterization 5 (ALTECH 2007). The PDF edition also includes the ALTECH 2007 papers.

Equipment Behavior Modelling for Fault Diagnosis and Deterioration Prognosis in Semiconductor Manufacturing
Equipment Behavior Modelling for Fault Diagnosis and Deterioration Prognosis in Semiconductor Manufacturing

Author: Hamideh Rostami

Publisher:

Published: 2018

Total Pages: 0

ISBN-13:

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Moving toward advanced technologies requires the modern industries, in particular, the semiconductor, to keep their equipment at a high utilization level and lowenvironmental risk. production deficiencies such as process variations and unexpected equipment breakdowns have made it difficult (if not impossible) to stay at high-grade product yield and significant equipment utilization. in this thesis, the aim is to propose efficient equipment behavior prognosis, and equipment failure diagnosis approaches in batch manufacturing processes that are pervasive modes in today's semiconductor fab. with the advancement of sensor information technology, efficient data-driven approaches are proposed for both prognostic and diagnostic purposes. in the fault diagnosis, this research firstly applies the support vector machine (svm) classifier to detect the abnormal observations. the normal process dynamics are then decomposed into different clusters by k-means clustering. principal component analysis (pca) is used to model each part of the process dynamics. fault fingerprints can be extracted finally by consolidating the out of control scenarios after projecting the abnormal observations into the pca models. in prognostics, an equipment deterioration modeling and monitoring approach for batch processes is developed with two aims: exploiting the temporal fdc (fault detection and classification) data to characterize the equipment behavior and modeling the deterioration trend with the potential causes. by using the discrete wavelet transformation (dwt), the temporal data are decomposed into approximation and detail components to detect two types of deterioration caused by macro- and micro-level variations. several scenarios of case studies are conducted based on the practical dataset provided by a local IC maker. the results show that the proposed approaches can effectively prognose the equipment behavior and diagnose the equipment failure with the correct causes.