Epioptics-10 - Proceedings Of The 43rd Course Of The International School Of Solid State Physics
Epioptics-10 - Proceedings Of The 43rd Course Of The International School Of Solid State Physics

Author: Antonio Cricenti

Publisher: World Scientific

Published: 2010-06-09

Total Pages: 273

ISBN-13: 9814464147

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The book is aimed at assessing the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and assessing the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing. Particular emphasis is placed on the theory of non-linear optics and dynamical processes through the use of pump-probe techniques together with the search for new optical sources. Some new applications of Scanning Probe Microscopy to Material science and biological samples, dried and in vivo, with the use of different laser sources are also presented. Materials of special interest are silicon, semiconductor-metal interfaces, semiconductor and magnetic multi-layers and III-V compound semiconductors.

Epioptics-10
Epioptics-10

Author: Antonio Cricenti

Publisher: World Scientific

Published: 2010

Total Pages: 273

ISBN-13: 9814322393

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The book is aimed at assessing the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and assessing the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing. Particular emphasis is placed on the theory of non-linear optics and dynamical processes through the use of pump-probe techniques together with the search for new optical sources. Some new applications of Scanning Probe Microscopy to Material science and biological samples, dried and in vivo, with the use of different laser sources are also presented. Materials of special interest are silicon, semiconductor-metal interfaces, semiconductor and magnetic multi-layers and III-V compound semiconductors.

Epioptics-11 - Proceedings Of The 49th Course Of The International School Of Solid State Physics
Epioptics-11 - Proceedings Of The 49th Course Of The International School Of Solid State Physics

Author: Antonio Cricenti

Publisher: World Scientific

Published: 2012-08-08

Total Pages: 140

ISBN-13: 9814417130

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The book is aimed at assessing the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and assessing the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing. Particular emphasis is dedicated to the theory of nonlinear optics and to dynamical processes through the use of pump-probe techniques together with the search for new optical sources. Some new applications of Scanning Probe Microscopy to Material Science and biological samples, dried and in vivo, with the use of different laser sources are also presented. Materials of particular interest are silicon, semiconductor-metal interfaces, semiconductor and magnetic multi-layers and III-V compound semiconductors.

Fundamentals of Semiconductor Manufacturing and Process Control
Fundamentals of Semiconductor Manufacturing and Process Control

Author: Gary S. May

Publisher: John Wiley & Sons

Published: 2006-05-26

Total Pages: 428

ISBN-13: 0471790273

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A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.

Dictionary of Acronyms and Technical Abbreviations
Dictionary of Acronyms and Technical Abbreviations

Author: Jakob Vlietstra

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 703

ISBN-13: 1447102630

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This Dictionary covers information and communication technology (ICT), including hardware and software; information networks, including the Internet and the World Wide Web; automatic control; and ICT-related computer-aided fields. The Dictionary also lists abbreviated names of relevant organizations, conferences, symposia and workshops. This reference is important for all practitioners and users in the areas mentioned above, and those who consult or write technical material. This Second Edition contains 10,000 new entries, for a total of 33,000.

Fundamentals of Semiconductor Fabrication
Fundamentals of Semiconductor Fabrication

Author: Gary S. May

Publisher: John Wiley & Sons

Published: 2004

Total Pages: 0

ISBN-13: 9780471452386

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"This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition. The book integrates Computer Modeling & Simulation tools throughout. Process simulation is used as a tool for what-if analysis and discussion. Comprehensive coverage of process sequence helps readers connect individual steps into a cohesive whole."--

The Fiber Bundle Model
The Fiber Bundle Model

Author: Alex Hansen

Publisher: John Wiley & Sons

Published: 2015-11-02

Total Pages: 254

ISBN-13: 352741214X

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Gathering research from physics, mechanical engineering, and statistics in a single resource for the first time, this text presents the background to the model, its theoretical basis, and applications ranging from materials science to earth science. The authors start by explaining why disorder is important for fracture and then go on to introduce the fiber bundle model, backed by various different applications. Appendices present the necessary mathematical, computational and statistical background required. The structure of the book allows the reader to skip some material that is too specialized, making this topic accessible to the engineering, mechanics and materials science communities, in addition to providing further reading for graduate students in statistical physics.

Transition Radiation and Transition Scattering,
Transition Radiation and Transition Scattering,

Author: Vitaliĭ Lazarevich Ginzburg

Publisher: CRC Press

Published: 1990

Total Pages: 456

ISBN-13:

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Book deals with radiation emission moving through plasmas and will be of interest to nuclear physicists, astrophysicsts. Russians very strong on plasma physics. Topical research, original material not available before. First appeared in 1984 but this translation includes two new chapters bringing it up to date, new referennces, 100 pages longer than previous edition. Usual criticism of translations does not apply as it's completely rewritten and revised. Ginzburg is one of the world's leading theoretical physicists. Tystovich is well known in the west, travels a lot, sometimes works in UK. AIP have other plasma books to promote with this. Plasma Physics Series.

Xenes
Xenes

Author: Alessandro Molle

Publisher: Elsevier

Published: 2022-07-04

Total Pages: 474

ISBN-13: 0128238240

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Xenes: 2D Synthetic Materials Beyond Graphene includes all the relevant information about Xenes thus far reported, focusing on emerging materials and new trends. The book's primary goal is to include full descriptions of each Xene type by leading experts in the area. Each chapter will provide key principles, theories, methods, experiments and potential applications. The book also reviews the key challenges for synthetic 2D materials such as characterization, modeling, synthesis, and integration strategies. This comprehensive book is suitable for materials scientists and engineers, physicists and chemists working in academia and R&D in industry. The discovery of silicene dates back to 2012. Since then, other Xenes were subsequently created with synthetic methods. The portfolio of Xenes includes different chemical elements of the periodic table and hence the related honeycomb-like lattices show a wealth of electronic and optical properties that can be successfully exploited for applications. Introduces the most important Xenes, including silicene, germanene, borophene, gallenene, phosphorene, and more Provides the fundamental principles, theories, experiments and applications for the most relevant synthetic 2D materials Addresses techniques for the characterization, synthesis and integration of synthetic 2D materials

Fundamentals of Inelastic Electron Scattering
Fundamentals of Inelastic Electron Scattering

Author: P. Schattschneider

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 205

ISBN-13: 3709188660

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Electron energy loss spectroscopy (ELS) is a vast subject with a long and honorable history. The problem of stopping power for high energy particles interested the earliest pioneers of quantum mechanics such as Bohr and Bethe, who laid the theoretical foun dations of the subject. The experimental origins might perhaps be traced to the original Franck-Hertz experiment. The modern field includes topics as diverse as low energy reflection electron energy loss studies of surface vibrational modes, the spectroscopy of gases and the modern theory of plasmon excitation in crystals. For the study of ELS in electron microscopy, several historically distinct areas of physics are relevant, including the theory of the Debye Waller factor for virtual inelastic scattering, the use of complex optical potentials, lattice dynamics for crystalline specimens and the theory of atomic ionisation for isolated atoms. However the field of electron energy loss spectroscopy contains few useful texts which can be recommended for students. With the recent appearance of Raether's and Egerton's hooks (see text for references), we have for the first time both a comprehensive review text-due to Raether-and a lucid introductory text which emphasizes experimental aspects-due to Egerton. Raether's text tends to emphasize the recent work on surface plasmons, while the strength of Egerton's book is its treatment of inner shell excitations for microanalysis, based on the use of atomic wavefunctions for crystal electrons.