Ellipsometry for Industrial Applications

Ellipsometry for Industrial Applications

Author: Karl Riedling

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 109

ISBN-13: 3709189616

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During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested.


Spectroscopic Ellipsometry

Spectroscopic Ellipsometry

Author: Hiroyuki Fujiwara

Publisher: John Wiley & Sons

Published: 2007-09-27

Total Pages: 388

ISBN-13: 9780470060186

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Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.


Ellipsometry at the Nanoscale

Ellipsometry at the Nanoscale

Author: Maria Losurdo

Publisher: Springer Science & Business Media

Published: 2013-03-12

Total Pages: 740

ISBN-13: 3642339565

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This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.


Spectroscopic Ellipsometry

Spectroscopic Ellipsometry

Author: Harland G. Tompkins

Publisher: Momentum Press

Published: 2015-12-16

Total Pages: 138

ISBN-13: 1606507281

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Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.


A User's Guide to Ellipsometry

A User's Guide to Ellipsometry

Author: Harland G. Tompkins

Publisher: Courier Corporation

Published: 2013-03-21

Total Pages: 496

ISBN-13: 0486151921

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This text on optics for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. Its 14 case studies illustrate concepts and reinforce applications of ellipsometry — particularly in relation to the semiconductor industry and to studies involving corrosion and oxide growth. A User's Guide to Ellipsometry will enable readers to move beyond limited turn-key applications of ellipsometers. In addition to its comprehensive discussions of the measurement of film thickness and optical constants in film, it also considers the trajectories of the ellipsometric parameters Del and Psi and how changes in materials affect parameters. This volume also addresses the use of polysilicon, a material commonly employed in the microelectronics industry, and the effects of substrate roughness. Three appendices provide helpful references.


Spectroscopic Ellipsometry for Photovoltaics

Spectroscopic Ellipsometry for Photovoltaics

Author: Hiroyuki Fujiwara

Publisher: Springer

Published: 2019-01-10

Total Pages: 628

ISBN-13: 3319951386

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Spectroscopic ellipsometry has been applied to a wide variety of material and device characterizations in solar cell research fields. In particular, device performance analyses using exact optical constants of component layers and direct analyses of complex solar cell structures are unique features of advanced ellipsometry methods. This second volume of Spectroscopic Ellipsometry for Photovoltaics presents various applications of the ellipsometry technique for device analyses, including optical/recombination loss analyses, real-time control and on-line monitoring of solar cell structures, and large-area structural mapping. Furthermore, this book describes the optical constants of 148 solar cell component layers, covering a broad range of materials from semiconductor light absorbers (inorganic, organic and hybrid perovskite semiconductors) to transparent conductive oxides and metals. The tabulated and completely parameterized optical constants described in this book are the most current resource that is vital for device simulations and solar cell structural analyses.


Spectroscopic Ellipsometry for Photovoltaics

Spectroscopic Ellipsometry for Photovoltaics

Author: Hiroyuki Fujiwara

Publisher: Springer

Published: 2019-01-10

Total Pages: 602

ISBN-13: 3319753770

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This book provides a basic understanding of spectroscopic ellipsometry, with a focus on characterization methods of a broad range of solar cell materials/devices, from traditional solar cell materials (Si, CuInGaSe2, and CdTe) to more advanced emerging materials (Cu2ZnSnSe4, organics, and hybrid perovskites), fulfilling a critical need in the photovoltaic community. The book describes optical constants of a variety of semiconductor light absorbers, transparent conductive oxides and metals that are vital for the interpretation of solar cell characteristics and device simulations. It is divided into four parts: fundamental principles of ellipsometry; characterization of solar cell materials/structures; ellipsometry applications including optical simulations of solar cell devices and online monitoring of film processing; and the optical constants of solar cell component layers.


Ellipsometry of Functional Organic Surfaces and Films

Ellipsometry of Functional Organic Surfaces and Films

Author: Karsten Hinrichs

Publisher: Springer Science & Business Media

Published: 2013-10-24

Total Pages: 369

ISBN-13: 3642401287

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Ellipsometry is the method of choice to determine the properties of surfaces and thin films. It provides comprehensive and sensitive characterization in contactless and non-invasive measurements. This book gives a state-of-the-art survey of ellipsometric investigations of organic films and surfaces, from laboratory to synchrotron applications, with a special focus on in-situ use in processing environments and at solid-liquid interfaces. In conjunction with the development of functional organic, meta- and hybrid materials for new optical, electronic, sensing and biotechnological devices and fabrication advances, the ellipsometric analysis of their optical and material properties has progressed rapidly in the recent years.


Ellipsometry

Ellipsometry

Author: Faustino Wahaia

Publisher: BoD – Books on Demand

Published: 2017-11-29

Total Pages: 164

ISBN-13: 9535136232

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Ellipsometry is rapidly emerging as a popular solution addressed to new materials science challenges and technological pitfalls hindering its effective application on modern problems. Amid the nowadays active development of materials of top notch, ellipsometry is also evolving rapidly both in the academic and industry sectors. The global industry strategies, introduce the latest scientific advances at manufacturing new, more accurate, and reliable ellipsometry systems to tackle emerging challenges. The book provides a comprehensive overview on the principles and technical capabilities of the modern ellipsometry highlighting its versatility in materials characterization.


In Situ Real-Time Characterization of Thin Films

In Situ Real-Time Characterization of Thin Films

Author: Orlando Auciello

Publisher: John Wiley & Sons

Published: 2001

Total Pages: 282

ISBN-13: 9780471241416

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An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application