Electrochemistry of Silicon and Its Oxide
Electrochemistry of Silicon and Its Oxide

Author: Xiaoge Gregory Zhang

Publisher: Springer Science & Business Media

Published: 2007-05-08

Total Pages: 525

ISBN-13: 0306479214

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It may be argued that silicon, carbon, hydrogen, oxygen, and iron are among the most important elements on our planet, because of their involvement in geological, biol- ical, and technological processes and phenomena. All of these elements have been studied exhaustively, and voluminous material is available on their properties. Included in this material are numerous accounts of their electrochemical properties, ranging from reviews to extensive monographs to encyclopedic discourses. This is certainly true for C, H, O, and Fe, but it is true to a much lesser extent for Si, except for the specific topic of semiconductor electrochemistry. Indeed, given the importance of the elect- chemical processing of silicon and the use of silicon in electrochemical devices (e. g. , sensors and photoelectrochemical cells), the lack of a comprehensive account of the electrochemistry of silicon in aqueous solution at the fundamental level is surprising and somewhat troubling. It is troubling in the sense that the non-photoelectrochemistry of silicon seems “to have fallen through the cracks,” with the result that some of the electrochemical properties of this element are not as well known as might be warranted by its importance in a modern technological society. Dr. Zhang’s book, Electrochemical Properties of Silicon and Its Oxide, will go a long way toward addressing this shortcoming. As with his earlier book on the elect- chemistry of zinc, the present book provides a comprehensive account of the elect- chemistry of silicon in aqueous solution.

Silicon
Silicon

Author: Eimutis Juzeliunas

Publisher: John Wiley & Sons

Published: 2023-04-03

Total Pages: 293

ISBN-13: 3527348972

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The expert reference on sustainable and energy-efficient production of photovoltaic-grade silicon materials Electrochemical methods, in particular molten-salt approaches, are a cost-effective, energy-efficient, and highly sustainable approach for producing solar-grade silicon. Surface micro- and nanostructuring methods for effective light harvesting, silicon electrorefining in molten salts, electrodeposition of photoresponsive films, and other related processes are likely to replace conventional carbothermic production methods. Silicon: Electrochemistry, Production, Purification and Applications presents an up-to-date summary of recent experimental and technological developments in the field, highlighting sustainable and energy-efficient processes for high-grade silicon production for a variety of photovoltaic and energy applications. Presented in a logical and concise format, this authoritative volume details the fundamental properties and technical processes of metal-grade silicon production and describes the various electrochemical methods for high-grade silicon production. Topics include silicon surface modification, chemical-physical structuring, porous and black silicon, electrochemical Si surface structuring and anodizing in molten salts, and more. Reviews the sustainable and energy-efficient production and purification of photovoltaic-grade silicon materials Summarizes recent progress in sustainable processes for high-grade silicon production Describes electrochemical methods for silicon production such as electrolysis, electrodeposition, and electrorefining Concludes with a discussion of future challenges and opportunities Written by a leading researcher in the field, Silicon: Electrochemistry, Production, Purification and Applications is a valuable resource for chemists and material scientists in academia and industry, particularly those working in sustainable energy development, photovoltaics, light harvesting efficiency, solar-to-chemical conversion, and production of solar-grade silicon, batteries, photoelectrodes, or silicon-based semiconductors.

Scanning Electrochemical Microscopy
Scanning Electrochemical Microscopy

Author: Allen J. Bard

Publisher: CRC Press

Published: 2022-07-29

Total Pages: 619

ISBN-13: 1000584054

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Because of its simplicity of use and quantitative results, Scanning Electrochemical Microscopy (SECM) has become an indispensable tool for the study of surface reactivity. The fast expansion of the SECM field over several years has been fueled by the introduction of new probes, commercially available instrumentation, and new practical applications. Scanning Electrochemical Microscopy, Third Edition offers essential background and in-depth overviews of specific applications in self-contained chapters. The vitality and growing popularity of SECM over the past 30+ years have largely been determined by its versatility and capability to remain useful in the changing scientific and technological environments. New applications reported during the last decade reflect significant current activity in biomedical and energy-related research. This thoroughly updated edition provides up-to-date comprehensive reviews of different aspects of SECM. New chapters by renowned professionals in the field cover recent advances in different areas of SECM including nanoSECM, surface reactions and films, batteries, and fuel cells. Expanded coverage of electrocatalysis and surface interrogation as well as photoelectrochemistry and photoelectrocatalysis are also provided. Useful for a broad range of interdisciplinary research—from biological systems to nanopatterning—this book is invaluable to all interested in learning and applying SECM.

Non-Crystalline Films for Device Structures
Non-Crystalline Films for Device Structures

Author:

Publisher: Elsevier

Published: 2001-12-11

Total Pages: 279

ISBN-13: 0080542956

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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.

Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11
Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics 11

Author: Electrochemical society. Meeting

Publisher: The Electrochemical Society

Published: 2011

Total Pages: 950

ISBN-13: 1566778654

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This issue of ECS Transactions contains the peer-reviewed full length papers of the International Symposium on Silicon Nitride, Silicon Dioxide, and Emerging Dielectrics held May 1-6, 2011 in Montreal as a part of the 219th Meeting of The Electrochemical Society. The papers address a very diverse range of topics. In addition to the deposition and characterization of the dielectrics, more specific topics addressed by the papers include applications, device characterization and reliability, interface states, interface traps, defects, transistor and gate oxide studies, and modeling.