Nonthermal Plasmas for Materials Processing
Nonthermal Plasmas for Materials Processing

Author: Jörg Florian Friedrich

Publisher: John Wiley & Sons

Published: 2022-07-15

Total Pages: 805

ISBN-13: 1119364760

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NONTHERMAL PLASMAS FOR MATERIALS PROCESSING This unique book covers the physical and chemical aspects of plasma chemistry with polymers and gives new insights into the interaction of physics and chemistry of nonthermal plasmas and their applications in materials science for physicists and chemists. The properties and characteristics of plasmas, elementary (collision) processes in the gas phase, plasma surface interactions, gas discharge plasmas and technical plasma sources, atmospheric plasmas, plasma diagnostics, polymers and plasmas, plasma polymerization, post-plasma processes, plasma, and wet-chemical processing, plasma-induced generation of functional groups, and the chemical reactions on these groups along with a few exemplary applications are discussed in this comprehensive but condensed state-of-the-art book on plasma chemistry and its dependence on plasma physics. While plasma physics, plasma chemistry, and polymer science are often handled separately, the aim of the authors is to harmoniously join the physics and chemistry of low-pressure and atmospheric-pressure plasmas with polymer surface chemistry and polymerization and to compare such chemistry with classic chemistry. Readers will find in these chapters Interaction of plasma physics and chemistry in plasmas and at the surface of polymers; Explanation and interpretation of physical and chemical mechanisms on plasma polymerization and polymer surface modification; Introduction of modern techniques in plasma diagnostics, surface analysis of solids, and special behavior of polymers on exposure to plasmas; Discussion of the conflict of energy-rich plasma species with permanent energy supply and the much lower binding energies in polymers and alternatives to avoid random polymer decomposition Technical applications such as adhesion, cleaning, wettability, textile modification, coatings, films, etc. New perspectives are explained about how to use selective and mild processes to allow post-plasma chemistry on non-degraded polymer surfaces. Audience Physicists, polymer chemists, materials scientists, industrial engineers in biomedicine, coatings, printing, etc.

Nonthermal Plasma Chemistry and Physics
Nonthermal Plasma Chemistry and Physics

Author: Jurgen Meichsner

Publisher: CRC Press

Published: 2012-11-13

Total Pages: 566

ISBN-13: 1420059165

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In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.

Low Temperature Plasma Physics
Low Temperature Plasma Physics

Author: R. Hippler

Publisher: Wiley-VCH

Published: 2001-06-18

Total Pages: 536

ISBN-13:

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Low-temperature plasma physics is a very active area of research located on the boundaries between physics, chemistry and materials science. Recent technological developments, e.g. in plasma etching or plasma deposition, have led to a revived interest in plasma physics and technology. This volume describes in detail fundamentals and applications of low-temperature plasma physics including newest achievements. The authors of this volume are top scientists from the USA and Europe who present most recent successes in our understanding of how plasmas behave and put a strong focus on the links between theory and experiment or technological process.

Microwave/RF Applicators and Probes for Material Heating, Sensing, and Plasma Generation
Microwave/RF Applicators and Probes for Material Heating, Sensing, and Plasma Generation

Author: Mehrdad Mehdizadeh

Publisher: William Andrew

Published: 2009-12-22

Total Pages: 402

ISBN-13: 0815519869

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Interactions of electromagnetic fields with materials at high frequencies have given rise to a vast array of practical applications in industry, science, medicine, and consumer markets. Applicators or probes, which are the front end of these systems, provide the field that interacts with the material. This book takes an integrated approach to the area of high frequency applicators and probes for material interactions, providing a toolkit for those who design these devices. Particular attention is given to real-world applications and the latest developments in the area. Mathematical methods are provided as design tools, and are often simplified via curve-fitting techniques that are particularly usable by handheld calculators. Useful equations and numerically solved examples, using situations encountered in practice, are supplied. Above all, this volume is a comprehensive and useful reference where the reader can find design rules and principles of high frequency applicators and probes for material processing and sensing applications. Electronic and electrical R&D engineers, physicists, university professors and students will all find this book a valuable reference. Mehrdad Mehdizadeh is with the DuPont Company, Engineering Research & Technology Division in Wilmington, Delaware. His areas of expertise include high frequency hardware and electromagnetic methods of processing, sensing, and characterization of materials. His work and innovation in industrial, scientific, and medical applications of radio frequency and microwaves has resulted in 19 US patents and a number of publications. He earned his Ph.D. and M.S. from Marquette University (1983, 1980), and a B.S. from Sharif University of Technology (1977), all in electrical engineering. Dr. Mehdizadeh is a Senior Member of the Institute of Electrical and Electronic Engineers (IEEE ), Sigma Xi (Scientific Research Society), the International Microwave Power Institute (IMPI ), and a voting member of IEEE Standard Association. - Books in this area are usually theoretical; this book provides practical information for those who actually intend to design a system - Features real world and numerically solved examples, and curve-fitted simple equations to replace complex equations provided in typical texts - Author is a voting member of IEEE Standards Association

Handbook of Advanced Plasma Processing Techniques
Handbook of Advanced Plasma Processing Techniques

Author: R.J. Shul

Publisher: Springer Science & Business Media

Published: 2011-06-28

Total Pages: 664

ISBN-13: 3642569897

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Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.

Plasma Nanoengineering and Nanofabrication
Plasma Nanoengineering and Nanofabrication

Author: Krasimir Vasilev

Publisher: MDPI

Published: 2018-07-04

Total Pages: 179

ISBN-13: 3038425583

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This book is a printed edition of the Special Issue "Plasma Nanoengineering and Nanofabrication" that was published in Nanomaterials