Dynamics in Small Confining Systems IV: Volume 543

Dynamics in Small Confining Systems IV: Volume 543

Author: J. M. Drake

Publisher:

Published: 1999-07-15

Total Pages: 392

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This book, the fourth in a series from the Materials Research Society, follows the tradition of earlier volumes in the series and covers a broad range of topics relating to structure and dynamics under geometric restrictions. Emphasis is on methods of probing confined systems, diffusion in porous media, polymers and membranes, dielectric and mechanical relaxation in nanopores, rheology and friction studies of embedded liquids, and properties of dendrimer supermolecules. Participants from many varied disciplines share their points of view on the fundamental questions of how spatial restrictions modify a system to behave significantly different than in bulk, how this difference relates to the molecular properties, and how it can be probed.


Liquid Dynamics

Liquid Dynamics

Author: John T. Fourkas

Publisher:

Published: 2002

Total Pages: 350

ISBN-13:

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The dynamics of liquids play a major role in many chemical, physical, and biological processes. However, the strong intermolecular interactions and high degree of disorder that characterize liquids pose a significant challenge to developing a detailed understanding of this state of matter. The chapters of this book describe current research using state-of-the-art techniques in experiment, simulation, and theory to unravel the mysteries of liquid behavior. Sections of the book are devoted to microscopic dynamics, photochemistry, vibrational dynamics, water, metastable liquids, and confined liquids. The introduction includes a detailed background discussion of terminology, major problems, and leading approaches in the context of these different topic areas.


III-V and IV-IV Materials and Processing Challenges for Highly Integrated Microelectronics and Optoelectronics: Volume 535

III-V and IV-IV Materials and Processing Challenges for Highly Integrated Microelectronics and Optoelectronics: Volume 535

Author: S. A. Ringel

Publisher:

Published: 1999-08-11

Total Pages: 338

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This book contains the proceedings of two symposia - 'Integration of Dissimilar Materials in Micro- and Optoelectronics' and 'III-V and SiGe Group IV Device/IC Processing Challenges for Commercial Applications'. The publication stems from the desire to achieve new levels of device functionality and higher levels of performance via integration of devices based on dissimilar semiconductors, where the constraint of lattice-matching on the breadth of attainable devices can be reduced. It covers fundamental topics germane to integration of a wide range of dissimilar materials spanning wide-bandgap III-V nitrides, III-V/Si integration, II-VI and II-VI/III-V compounds, heterovalent structures, oxides, photonic bandgap structures and others. Topics such as compliancy, dislocation control, selective area growth, bonding methodologies, etc. are featured. It also addresses processing issues in the manufacturing of III-V and Si-based heterostructures for commercial products. Here, the success enjoyed by silicon germanium technology is contrasted by the promise of silicon-carbon alloys which have opportunities and challenges for the new generation of process developers.


In Situ Process Diagnostics and Modeling: Volume 569

In Situ Process Diagnostics and Modeling: Volume 569

Author: Orlando Auciello

Publisher:

Published: 1999-08-11

Total Pages: 226

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Papers from an April 1999 symposium demonstrate the need for the development and application of a variety of complementary in situ, real-time characterization techniques to advance the science and technology of thin films and interfaces critical to the development of a new generation of thin-film-based devices. Papers are arranged in sections on in situ ion and electron-beam analysis, in situ spectroscopic ellipsometry and other optical characterization, in situ diagnostics and modeling, in situ emission and optical characterization techniques, and in situ X-ray, TEM, and STM/AFM characterization and processing control. Auciello is affiliated with Argonne National Laboratory. Annotation copyrighted by Book News, Inc., Portland, OR


Organic Nonlinear Optical Materials and Devices: Volume 561

Organic Nonlinear Optical Materials and Devices: Volume 561

Author: B. Kippelen

Publisher:

Published: 1999-08-11

Total Pages: 248

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The field of organic optical materials is rapidly growing, and advances are being made both in attaining a deeper understanding of device phenomena and in designing improved materials for thin films, fibers and waveguides. This book offers an interdisciplinary discussion of research on electronic and photonic devices made with organic and polymeric materials. The 1999 MRS Spring Meeting was highlighted by several major advances in fields ranging from nonlinear absorbers and electro-optic polymers, to photorefractive polymers, organic transistors and electroluminescent materials and devices for displays. This book highlights developments in materials chemistry and physics relevant to such devices and strikes a balance between basic science and technology. Topics include: nonlinear optical materials; photorefractive polymers; and electronic and light-emitting materials.


Plasma Deposition and Treatment of Polymers: Volume 544

Plasma Deposition and Treatment of Polymers: Volume 544

Author: Wei William Lee

Publisher:

Published: 1999-09

Total Pages: 320

ISBN-13:

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There is immense interest, both industrial and academic, in developing processes for plasma deposition and modification of polymers. These polymers and treatments have wide-ranging applications in electronics, protective coatings, optical coatings, biomaterials, ophthalmics, corrosion protection, tribology, surface mechanics, membranes, food and pharmaceutical packaging, and sensors. In addition, fundamentals of plasma processes and technology are also of critical importance in many semiconductor processing operations such as etching and treatment of polymers, deposition of low-dielectric constant materials, and dry photoresist. The understanding of plasma polymer deposition in various technical fields, as well as in the treatment methods of polymers, have become critical. This book focuses on the deposition, modification and characterization of polymeric materials which are important for advanced technologies. Particular emphasis is placed on materials and synthesis concepts. Topics include: plasma processes for biomaterials; fundamentals of plasma processing; plasma processing for electronics and optics; and plasma treatments and functional coatings.