Crucial Issues in Semiconductor Materials and Processing Technologies
Crucial Issues in Semiconductor Materials and Processing Technologies

Author: S. Coffa

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 523

ISBN-13: 940112714X

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Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.

Large-Angle Convergent-Beam Electron Diffraction Applications to Crystal Defects
Large-Angle Convergent-Beam Electron Diffraction Applications to Crystal Defects

Author: Jean- Paul Morniroli

Publisher: CRC Press

Published: 2004-11-01

Total Pages: 432

ISBN-13: 9781420034073

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A publication of the French Society of Microscopies, Large-Angle Convergent-Beam Electron Diffraction Applications to Crystal Defects is devoted to an important aspect of electron diffraction. Convergent-beam diffraction is capable of furnishing remarkably accurate crystallographic information. In this book, the author goes well beyond a simple presentation of the method. The description of convergent-beam electron diffraction and especially of LACBED is preceded by several preparatory chapters, in which the principles of diffraction and the nature of electron-matter interactions are clearly set out. An entire chapter is concerned with instrumentation. Another on the interpretation of diffraction patterns enables the reader to master all stages in the process. The book ends with a long chapter in which numerous applications concerned with the characterization of crystal defects are examined and analyzed.

Defects in Semiconductors
Defects in Semiconductors

Author:

Publisher: Academic Press

Published: 2015-06-08

Total Pages: 458

ISBN-13: 0128019409

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This volume, number 91 in the Semiconductor and Semimetals series, focuses on defects in semiconductors. Defects in semiconductors help to explain several phenomena, from diffusion to getter, and to draw theories on materials' behavior in response to electrical or mechanical fields. The volume includes chapters focusing specifically on electron and proton irradiation of silicon, point defects in zinc oxide and gallium nitride, ion implantation defects and shallow junctions in silicon and germanium, and much more. It will help support students and scientists in their experimental and theoretical paths. - Expert contributors - Reviews of the most important recent literature - Clear illustrations - A broad view, including examination of defects in different semiconductors

Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10
Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10

Author: Takeshi Hattori

Publisher: The Electrochemical Society

Published: 2007

Total Pages: 497

ISBN-13: 156677568X

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This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.

Defects and Impurities in Silicon Materials
Defects and Impurities in Silicon Materials

Author: Yutaka Yoshida

Publisher: Springer

Published: 2016-03-30

Total Pages: 498

ISBN-13: 4431558004

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This book emphasizes the importance of the fascinating atomistic insights into the defects and the impurities as well as the dynamic behaviors in silicon materials, which have become more directly accessible over the past 20 years. Such progress has been made possible by newly developed experimental methods, first principle theories, and computer simulation techniques. The book is aimed at young researchers, scientists, and technicians in related industries. The main purposes are to provide readers with 1) the basic physics behind defects in silicon materials, 2) the atomistic modeling as well as the characterization techniques related to defects and impurities in silicon materials, and 3) an overview of the wide range of the research fields involved.