Computer Aided Design and Manufacturing
Computer Aided Design and Manufacturing

Author: Zhuming Bi

Publisher: John Wiley & Sons

Published: 2020-02-04

Total Pages: 661

ISBN-13: 1119534240

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Broad coverage of digital product creation, from design to manufacture and process optimization This book addresses the need to provide up-to-date coverage of current CAD/CAM usage and implementation. It covers, in one source, the entire design-to-manufacture process, reflecting the industry trend to further integrate CAD and CAM into a single, unified process. It also updates the computer aided design theory and methods in modern manufacturing systems and examines the most advanced computer-aided tools used in digital manufacturing. Computer Aided Design and Manufacturing consists of three parts. The first part on Computer Aided Design (CAD) offers the chapters on Geometric Modelling; Knowledge Based Engineering; Platforming Technology; Reverse Engineering; and Motion Simulation. The second part on Computer Aided Manufacturing (CAM) covers Group Technology and Cellular Manufacturing; Computer Aided Fixture Design; Computer Aided Manufacturing; Simulation of Manufacturing Processes; and Computer Aided Design of Tools, Dies and Molds (TDM). The final part includes the chapters on Digital Manufacturing; Additive Manufacturing; and Design for Sustainability. The book is also featured for being uniquely structured to classify and align engineering disciplines and computer aided technologies from the perspective of the design needs in whole product life cycles, utilizing a comprehensive Solidworks package (add-ins, toolbox, and library) to showcase the most critical functionalities of modern computer aided tools, and presenting real-world design projects and case studies so that readers can gain CAD and CAM problem-solving skills upon the CAD/CAM theory. Computer Aided Design and Manufacturing is an ideal textbook for undergraduate and graduate students in mechanical engineering, manufacturing engineering, and industrial engineering. It can also be used as a technical reference for researchers and engineers in mechanical and manufacturing engineering or computer-aided technologies.

Technology Computer Aided Design
Technology Computer Aided Design

Author: Chandan Kumar Sarkar

Publisher: CRC Press

Published: 2018-09-03

Total Pages: 462

ISBN-13: 1466512660

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Responding to recent developments and a growing VLSI circuit manufacturing market, Technology Computer Aided Design: Simulation for VLSI MOSFET examines advanced MOSFET processes and devices through TCAD numerical simulations. The book provides a balanced summary of TCAD and MOSFET basic concepts, equations, physics, and new technologies related to TCAD and MOSFET. A firm grasp of these concepts allows for the design of better models, thus streamlining the design process, saving time and money. This book places emphasis on the importance of modeling and simulations of VLSI MOS transistors and TCAD software. Providing background concepts involved in the TCAD simulation of MOSFET devices, it presents concepts in a simplified manner, frequently using comparisons to everyday-life experiences. The book then explains concepts in depth, with required mathematics and program code. This book also details the classical semiconductor physics for understanding the principle of operations for VLSI MOS transistors, illustrates recent developments in the area of MOSFET and other electronic devices, and analyzes the evolution of the role of modeling and simulation of MOSFET. It also provides exposure to the two most commercially popular TCAD simulation tools Silvaco and Sentaurus. • Emphasizes the need for TCAD simulation to be included within VLSI design flow for nano-scale integrated circuits • Introduces the advantages of TCAD simulations for device and process technology characterization • Presents the fundamental physics and mathematics incorporated in the TCAD tools • Includes popular commercial TCAD simulation tools (Silvaco and Sentaurus) • Provides characterization of performances of VLSI MOSFETs through TCAD tools • Offers familiarization to compact modeling for VLSI circuit simulation R&D cost and time for electronic product development is drastically reduced by taking advantage of TCAD tools, making it indispensable for modern VLSI device technologies. They provide a means to characterize the MOS transistors and improve the VLSI circuit simulation procedure. The comprehensive information and systematic approach to design, characterization, fabrication, and computation of VLSI MOS transistor through TCAD tools presented in this book provides a thorough foundation for the development of models that simplify the design verification process and make it cost effective.

Introducing Technology Computer-Aided Design (TCAD)
Introducing Technology Computer-Aided Design (TCAD)

Author: Chinmay K. Maiti

Publisher: CRC Press

Published: 2017-03-16

Total Pages: 438

ISBN-13: 9814745529

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This might be the first book that deals mostly with the 3D technology computer-aided design (TCAD) simulations of major state-of-the-art stress- and strain-engineered advanced semiconductor devices: MOSFETs, BJTs, HBTs, nonclassical MOS devices, finFETs, silicon-germanium hetero-FETs, solar cells, power devices, and memory devices. The book focuses on how to set up 3D TCAD simulation tools, from mask layout to process and device simulation, including design for manufacturing (DFM), and from device modeling to SPICE parameter extraction. The book also offers an innovative and new approach to teaching the fundamentals of semiconductor process and device design using advanced TCAD simulations of various semiconductor structures. The simulation examples chosen are from the most popular devices in use today and provide useful technology and device physics insights. To extend the role of TCAD in today’s advanced technology era, process compact modeling and DFM issues have been included for design–technology interface generation. Unique in approach, this book provides an integrated view of silicon technology and beyond—with emphasis on TCAD simulations. It is the first book to provide a web-based online laboratory for semiconductor device characterization and SPICE parameter extraction. It describes not only the manufacturing practice associated with the technologies used but also the underlying scientific basis for those technologies. Written from an engineering standpoint, this book provides the process design and simulation background needed to understand new and future technology development, process modeling, and design of nanoscale transistors. The book also advances the understanding and knowledge of modern IC design via TCAD, improves the quality in micro- and nanoelectronics R&D, and supports the training of semiconductor specialists. It is intended as a textbook or reference for graduate students in the field of semiconductor fabrication and as a reference for engineers involved in VLSI technology development who have to solve device and process problems. CAD specialists will also find this book useful since it discusses the organization of the simulation system, in addition to presenting many case studies where the user applies TCAD tools in different situations.

Computer-Aided Design, Manufacturing, Modeling and Simulation
Computer-Aided Design, Manufacturing, Modeling and Simulation

Author:

Publisher:

Published: 2011

Total Pages: 780

ISBN-13:

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The aim of this special volume was to facilitate the exchange of information concerning the best practices for CAD, CAM, Manufacturing, Mechanical Engineering, Modeling and Simulation, etc. It provided the opportunity for engineers and scientists in academia, industry, and government to address the most innovative research and developments, including technical challenges, social and economic issues, and to discuss ideas, results, work-in-progress and experience touching all aspects of Computer-Aided Design, Manufacturing, Modeling and Simulation. Review from Book News Inc.: The 140 papers selected for the September 2011 conference share research on advanced manufacturing technology, modeling nanosystems, intelligent design, adaptive control, scheduling, and power electronics. The second volume of the two-volume set focuses on software development, system optimization, vibrations and dynamics, sustainable materials, and virtual manufacturing. The Chinese contributors propose a feature extraction method for mechanical part recognition, an assembly matrix for aircraft components, a boiler temperature field reconstruction algorithm, and an absolute magnetic grid displacement sensor. Other topics include heat and moisture transfer in environmental clothing, wind turbine blade design, mine emergency rescue paths, and digital watermarking for CAD models. B & w images are provided.

21st European Symposium on Computer Aided Process Engineering
21st European Symposium on Computer Aided Process Engineering

Author: E. N. Pistikopoulos

Publisher: Elsevier

Published: 2011-07-21

Total Pages: 2087

ISBN-13: 044453895X

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The European Symposium on Computer Aided Process Engineering (ESCAPE) series presents the latest innovations and achievements of leading professionals from the industrial and academic communities. The ESCAPE series serves as a forum for engineers, scientists, researchers, managers and students to present and discuss progress being made in the area of computer aided process engineering (CAPE). European industries large and small are bringing innovations into our lives, whether in the form of new technologies to address environmental problems, new products to make our homes more comfortable and energy efficient or new therapies to improve the health and well being of European citizens. Moreover, the European Industry needs to undertake research and technological initiatives in response to humanity's "Grand Challenges," described in the declaration of Lund, namely, Global Warming, Tightening Supplies of Energy, Water and Food, Ageing Societies, Public Health, Pandemics and Security. Thus, the Technical Theme of ESCAPE 21 will be "Process Systems Approaches for Addressing Grand Challenges in Energy, Environment, Health, Bioprocessing & Nanotechnologies."

Simulations for Design and Manufacturing
Simulations for Design and Manufacturing

Author: Uday S. Dixit

Publisher: Springer

Published: 2018-04-19

Total Pages: 308

ISBN-13: 9811085188

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This book focuses on numerical simulations of manufacturing processes, discussing the use of numerical simulation techniques for design and analysis of the components and the manufacturing systems. Experimental studies on manufacturing processes are costly, time consuming and limited to the facilities available. Numerical simulations can help study the process at a faster rate and for a wide range of process conditions. They also provide good prediction accuracy and deeper insights into the process. The simulation models do not require any pre-simulation, experimental or analytical results, making them highly suitable and widely used for the reliable prediction of process outcomes. The book is based on selected proceedings of AIMTDR 2016. The chapters discuss topics relating to various simulation techniques, such as computational fluid dynamics, heat flow, thermo-mechanical analysis, molecular dynamics, multibody dynamic analysis, and operational modal analysis. These simulation techniques are used to: 1) design the components, 2) to investigate the effect of critical process parameters on the process outcome, 3) to explore the physics of the process, 4) to analyse the feasibility of the process or design, and 5) to optimize the process. A wide range of advanced manufacturing processes are covered, including friction stir welding, electro-discharge machining, electro-chemical machining, magnetic pulse welding, milling with MQL (minimum quantity lubrication), electromagnetic cladding, abrasive flow machining, incremental sheet forming, ultrasonic assisted turning, TIG welding, and laser sintering. This book will be useful to researchers and professional engineers alike.