Chemisorption And Reactions On Metallic Films V1
Chemisorption And Reactions On Metallic Films V1

Author: J Anderson

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 568

ISBN-13: 0323145698

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Chemisorption and Reactions on Metallic Films, Volume 1 is a six-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry. Chapter 1 presents electron microscopy and diffraction studies and their contributions in elucidating the growth and structure of polycrystalline and epitaxially grown films. Chapter 2 describes the techniques of preparation and characterization of metallic films and examines the heats of adsorption, electrical conductivity, surface area, and sticking probabilities of such films. Chapter 3 discusses the strength of pairwise interactions; the influence of the intermetallic bond on the equilibrium shape of metal crystallites; the bonding of individual metal atoms to different crystallographic planes; the interaction of metal atoms and crystallites with non-conducting substrates; and the effects of residual gases on this interaction. Chapters 4 and 5 address the adsorption of metallic films, with an emphasis on general trends in adsorptive and electronic properties of bulk metals. These chapters also discuss the effects of adsorption on the electrical conductance of island-like and coherent films and on the ferromagnetic properties of films. Chapter 6 evaluates the application of infrared spectroscopy to the studies of the surfaces of metal films and the use of the available infrared spectroscopic data in reconciling the results of adsorption studies on oxide-supported metal particles with those obtained with clean evaporated metal films prepared under ultra high vacuum conditions. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.

Characterization of Metal and Polymer Surfaces V1
Characterization of Metal and Polymer Surfaces V1

Author: Lieng-Huang Lee

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 533

ISBN-13: 0323146910

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Characterization of Metal and Polymer Surfaces, Volume 1: Metal Surfaces presents the proceedings of the Symposium on Advances in Characterization of Metal and Polymer Surfaces, held in New York, on April 5–8, 1976. This book provides information pertinent to surface science and discusses the applications of surface analyses to polymer technology. Organized into five parts encompassing 19 chapters, this compilation of papers starts with an overview of the important innovations of surface analyses and discusses the possible applications of each method to polymer technology. This text then explores atom-probe field ion microscopy, which is the most sensitive micro-analytical tool that combines the single atom resolution of a field ion microscope with mass spectrometric single ion identification. Other chapters discuss the application of Mössbauer spectroscopy as a technique for studying corrosion phenomena. The final chapter deals with the capabilities and limitations of the method of inelastic electron tunnelling. This book is a valuable resource for analytical and polymer chemists.

Surface Physics of Materials V1
Surface Physics of Materials V1

Author: J.M. Blakely

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 297

ISBN-13: 0323157076

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Surface Physics of Materials provides an account of the physical properties of solid surfaces. It examines the status of work on a number of aspects of solid surfaces and predicts the most profitable avenues for future research. The book contains a set of papers carefully selected to give broad coverage of the field of surface physics. The individual chapters deal with topics of current research interest and emphasize surface properties rather than the applicability of experimental techniques. The book covers different properties such as surface crystallography, electronic structure, and statistical thermodynamics of surface. It also provides a background of the importance of surfaces and interfaces in solid state devices and chemical reactions. This book caters to research workers, teachers, and graduate students in surface physics and serves as reference texts for the materials scientist specializing in other branches of the subject.

Electronic Processes on Semiconductor Surfaces during Chemisorption
Electronic Processes on Semiconductor Surfaces during Chemisorption

Author: T. Wolkenstein

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 457

ISBN-13: 1461536561

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"Hands are useless if there are no eyes to see what is obvious." -M. V. Lomonosov Dear Reader, I invite you to open this book and step on the semiconductor surface, where the processes that form the subject of the book come into play. The surface of the semiconductor is attracting more and more interest among researchers, in fact researchers in two different fields. These are notably the physicists and engineers engaged in research in semi conductor physics and the making of semiconductor devices. The entire industry of semiconductor instruments hinges on the problem of the surface. The quality of semiconductor devices, whose use is growing steadily, depends essentially on the properties of the surface. The instability of these properties and their uncon trollable alterations with temperature and under the influence of environmental conditions result in a lack of stability in the performance of semiconductor devices, hence the high percentage of waste in their industrial production. The methods used in factory laboratories to prevent such waste are largely empirical. The properties of the surface, the nature of the physicochemical processes that take place on it, and the role of environmental factors still remain obscure. A major task of the semiconductor industry is to learn to control the properties of the surface.

Chemisorption And Reactions On Metallic Films V2
Chemisorption And Reactions On Metallic Films V2

Author: J Anderson

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 336

ISBN-13: 0323155316

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Chemisorption and Reactions on Metallic Films, Volume 2 is a four-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry and in understanding of adsorption and catalysis at metal surfaces. This volume first describes film structure and properties, particularly of random polycrystalline films, as well as the concepts of the adsorption and kinetic phenomena. The topic is followed by an overview of the main classes of catalytic reactions that have been studied over evaporated metal film catalysts. A chapter explores the preparation, characterization, structure, and surface properties of alloy films. The theory of the oxidation of metals and the advantages and disadvantages of using thin metal films in oxidation work are considered in the concluding chapter, along with a brief discussion on their use in kinetic and mechanistic studies. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.