Chemical Beam Epitaxy and Related Growth Techniques 1995
Author: C. R. Abernathy
Publisher:
Published: 1996
Total Pages: 504
ISBN-13:
DOWNLOAD EBOOKRead and Download eBook Full
Author: C. R. Abernathy
Publisher:
Published: 1996
Total Pages: 504
ISBN-13:
DOWNLOAD EBOOKAuthor: C. W. Tu
Publisher:
Published: 1996
Total Pages:
ISBN-13:
DOWNLOAD EBOOKAuthor: C. R. Abernathy
Publisher:
Published: 1996
Total Pages: 503
ISBN-13:
DOWNLOAD EBOOKAuthor: C. W. Tu
Publisher:
Published: 1996
Total Pages: 503
ISBN-13:
DOWNLOAD EBOOKAuthor: C. R. Abernathy
Publisher:
Published: 1996
Total Pages: 503
ISBN-13:
DOWNLOAD EBOOKAuthor: C. R. Abernathy
Publisher:
Published: 1996
Total Pages: 503
ISBN-13:
DOWNLOAD EBOOKAuthor: John S. Foord
Publisher: John Wiley & Sons
Published: 1997-12-08
Total Pages: 472
ISBN-13:
DOWNLOAD EBOOKChemical Beam Epitaxy (CBE), is a powerful growth technique which has come to prominence over the last ten years. Together with the longer established molecular beam epitaxy (MBE) and metal organic vapour phase epitaxy (MOVPE), CBE provides a capability for the epitaxial growth of semiconductor and other advanced materials with control at the atomic limit. This, the first book dedicated to CBE, and closely related techniques comprises chapters by leading research workers in the field and provides a detailed overview of the state-of-the-art in this area of semiconductor technology. Topics covered include equipment design and safety considerations, design of chemical precursors, surface chemistry and growth mechanisms, materials and devices from arsenide, phosphide, antimonide, silicon and II-VI compounds, doping, selected area epitaxy and etching. The volume provides an introduction for those new to the field and a detailed summary for experienced researchers.
Author: G. J. Davies
Publisher:
Published: 1992
Total Pages:
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Publisher:
Published: 1993
Total Pages:
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DOWNLOAD EBOOKAuthor:
Publisher:
Published: 1992
Total Pages:
ISBN-13:
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