Growth and Characterization of Ito Thin Film by Magnetron Sputtering

Growth and Characterization of Ito Thin Film by Magnetron Sputtering

Author: Öcal Tuna

Publisher: LAP Lambert Academic Publishing

Published: 2010-05

Total Pages: 100

ISBN-13: 9783838365695

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In this study Indium Tin Oxide (ITO) thin films were grown by both DC and RF magnetron sputtering techniques. To know deposition rate of ITO, system was calibrated for both DCMS and RFMS and then ITO were grown on glass substrate with the thickness of 70 nm and 40 nm by changing substrate temperature. The effect of substrate temperature, film thickness and sputtering method on structural, electrical and optical properties were investigated. The results show that substrate temperature and film thickness substantially affects the film properties, especially crystallization and resistivity. The thin films grown at the lower than 150 oC showed amorphous structure. However, crystallization was detected with the furtherincrease of substrate temperature. Band gap of ITO was calculated to be about 3.64eV at the substrate temperature of 150 oC, and itwidened with substrate temperature increment. From electrical measurements the resistivity at room temperature was obtained 1.28x10-4 and 1.29x10-4 D-cm, for DC and RF sputtered films, respectively. We also measured temperature dependence resistivity and the Hall coefficient of the films, and we calculated carrier concentration and Hall mobility."


CHARACTERIZATION OF CHARGE INJECTION PROCESSES OF THIN FILMS ON INDIUM TIN OXIDE ELECTRODES USING A NOVEL SPECTROELECTROCHEMICAL TECHNIQUE: POTENTIAL-MODULATED ATTENUATED TOTAL REFLECTANCE SPECTROSCOPY.

CHARACTERIZATION OF CHARGE INJECTION PROCESSES OF THIN FILMS ON INDIUM TIN OXIDE ELECTRODES USING A NOVEL SPECTROELECTROCHEMICAL TECHNIQUE: POTENTIAL-MODULATED ATTENUATED TOTAL REFLECTANCE SPECTROSCOPY.

Author: Zeynep Araci

Publisher:

Published: 2010

Total Pages: 482

ISBN-13:

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Understanding interfacial charge injection processes is one of the key factors needed for development of efficient organic electronic devices, such as biosensors and energy conversion systems, since these processes control the electrical characteristics of these devices. Spectroelectrochemical characterization of electron transfer processes occurring at the electrode - electroactive thin film interface has been evaluated to improve our understanding of charge transfer kinetics using a novel form of electroreflectance spectroscopy, potential-modulated attenuated total reflectance (PM-ATR), which makes it possible to sensitively monitor spectroscopic changes in thin films as a function of applied potential. PM-ATR was used to evaluate three different redox-active films deposited on indium tin oxide (ITO) electrodes to investigate: i) the orientation dependence of charge transfer rates of thin films of biomolecules, ii) surface treatment and modification effects on charge transfer kinetics of conducting polymers and, iii) estimation of rates of electron injection and conduction band edge of semiconductor nanocrystalline materials. First, Prussian blue film as a model system was used successfully to examine the PM-ATR technique for determination of the charge transfer rate constant between ITO and a molecular film. Second, an anisotropic and redox active protein film, cytochrome c, was used to probe charge transfer rates with respect to molecular orientation. The electron transfer rate measured using TM polarized light was four-fold greater than that measured using TE polarized light. These data are the first to correlate a distribution of molecular orientations with a distribution of electron transfer rates in a redox-active molecular film. Third, the effects of ITO surface treatment and modification on charge transfer kinetics on a conducting polymer, poly(3,4-ethylenedioxythiophene/)/poly(styrenesulfonate) (PEDOT/PSS), were studied. The apparent interfacial charge transfer rate constant for PEDOT/PSS on ITO has been reported for the first time which cannot be measured otherwise with conventional electrochemistry due to high non-Faradaic background of PEDOT/PSS films. Fourth, PM-ATR enabled characterization of reversible redox processes between submonolayer coverages of surface-tethered, CdSe nanocrystals and ITO for the first time. Optically determined onset potentials for electron injection were used for estimation for the conduction band and valance band energies (ECB and EVB, respectively).


RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

Author: Anil Kumar Gadipelly

Publisher: LAP Lambert Academic Publishing

Published: 2015-02-04

Total Pages: 176

ISBN-13: 9783659539350

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In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.