Characterisation of Strained Silicon/silicon Germanium Metal-oxide-semiconductor Devices
Author: Kelvin Sian Kiat Kwa
Publisher:
Published: 2004
Total Pages: 176
ISBN-13:
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Author: Kelvin Sian Kiat Kwa
Publisher:
Published: 2004
Total Pages: 176
ISBN-13:
DOWNLOAD EBOOKAuthor: Rameshwari Chinchani
Publisher:
Published: 2004
Total Pages: 140
ISBN-13:
DOWNLOAD EBOOKAuthor: M. Willander
Publisher: Elsevier
Published: 2003-10-02
Total Pages: 325
ISBN-13: 008054102X
DOWNLOAD EBOOKThe study of Silicone Germanium strained layers has broad implications for material scientists and engineers, in particular those working on the design and modelling of semi-conductor devices. Since the publication of the original volume in 1994, there has been a steady flow of new ideas, new understanding, new Silicon-Germanium (SiGe) structures and new devices with enhanced performance. Written for both students and senior researchers, the 2nd edition of Silicon-Germanium Strained Layers and Heterostructures provides an essential up-date of this important topic, describing in particular the recent developments in technology and modelling. * Fully-revised and updated 2nd edition incorporating important recent breakthroughs and a complete literature review* The extensive bibliography of over 400 papers provides a comprehensive and coherent overview of the subject* Appropriate for students and senior researchers
Author: Cor Claeys
Publisher: Springer
Published: 2018-08-13
Total Pages: 464
ISBN-13: 3319939254
DOWNLOAD EBOOKThis book provides a unique review of various aspects of metallic contamination in Si and Ge-based semiconductors. It discusses all of the important metals including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on electrical devices’ performance. Several control and possible gettering approaches are addressed. The book offers a valuable reference guide for all researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. Adopting an interdisciplinary approach, it combines perspectives from e.g. material science, defect engineering, device processing, defect and device characterization, and device physics and engineering.
Author: Peter John Bjeletich
Publisher:
Published: 2004
Total Pages: 480
ISBN-13:
DOWNLOAD EBOOKAuthor: C.K Maiti
Publisher: CRC Press
Published: 2001-07-20
Total Pages: 402
ISBN-13: 1420034693
DOWNLOAD EBOOKThe first book to deal with the design and optimization of transistors made from strained layers, Applications of Silicon-Germanium Heterostructure Devices combines three distinct topics-technology, device design and simulation, and applications-in a comprehensive way. Important aspects of the book include key technology issues for the growth of st
Author: Gudrun Kissinger
Publisher: CRC Press
Published: 2014-12-09
Total Pages: 436
ISBN-13: 1466586648
DOWNLOAD EBOOKDespite the vast knowledge accumulated on silicon, germanium, and their alloys, these materials still demand research, eminently in view of the improvement of knowledge on silicon–germanium alloys and the potentialities of silicon as a substrate for high-efficiency solar cells and for compound semiconductors and the ongoing development of nanodevices based on nanowires and nanodots. Silicon, Germanium, and Their Alloys: Growth, Defects, Impurities, and Nanocrystals covers the entire spectrum of R&D activities in silicon, germanium, and their alloys, presenting the latest achievements in the field of crystal growth, point defects, extended defects, and impurities of silicon and germanium nanocrystals. World-recognized experts are the authors of the book’s chapters, which span bulk, thin film, and nanostructured materials growth and characterization problems, theoretical modeling, crystal defects, diffusion, and issues of key applicative value, including chemical etching as a defect delineation technique, the spectroscopic analysis of impurities, and the use of devices as tools for the measurement of materials quality.
Author: Bader Saad Alharthi
Publisher:
Published: 2018
Total Pages: 330
ISBN-13:
DOWNLOAD EBOOKThe bright future of silicon (Si) photonics has attracted research interest worldwide. The ultimate goal of this growing field is to develop a group IV based Si foundries that integrate Si-photonics with the current complementary metal-oxide-semiconductor (CMOS) on a single chip for mid-infrared optoelectronics and high speed devices. Even though group IV was used in light detection, such as photoconductors, it is still cannot compete with III-V semiconductors for light generation. This is because most of the group IV elements, such as Si and germanium (Ge), are indirect bandgap materials. Nevertheless, Ge and Si attracted industry attention because they are cheap to be used with low cost and high volume manufacturing. Thus, enhancing their light efficiency is highly desired. A key solution to improve the light efficiency of Ge is by growing tensile strained Ge-on-Si and SixGe1-x-ySny (Sn: tin) alloys. In this dissertation, Si-Ge-Sn material system was grown using chemical vapor deposition technique and further characterized by advanced optical and material techniques. Ge-on-Si was grown at low growth temperatures by using plasma enhancement in order to achieve growth conditions compatible with CMOS technology with high quality Ge layers. First, a single step Ge layer was grown at low temperatures (T≤ 450°C). The material and optical characterization of the single step reveal low material and optical qualities. Second, a two-step Ge-on-Si was grown (T≤ 525°C) to improve the quality. The results show low threading dislocation density on the order of 107 cm-2 with roughness values on the order of several nm. Optical characterization reveal optical quality close to a Ge buffer grown by a traditional high temperature method. In addition, bulk and quantum well SixGe1-x-ySny alloys were grown. The results indicate that lattice matched bulk SiGeSn/Ge can be grown with high optical and material qualities using low cost commercial precursors. In addition, band structure and optical analysis results from a single Ge0.865Sn0.135 quantum well with Si0.04Ge0.895Sn0.065 double barriers on a relaxed Ge0.918Sn0.08 buffer indicate a type-I band alignment with direct bandgap emission. Moreover, SiGeSn barriers improved the optical confinement as compared to GeSn barriers.
Author: Erich Kasper
Publisher: Institution of Electrical Engineers
Published: 1995
Total Pages: 0
ISBN-13: 9780852968260
DOWNLOAD EBOOKThis volume systematically evaluates and reviews the properties of silicon germanium within a structured framework, relating them where appropriate to stoichiometry and strain. The invited contributions include concise discussion and expert guidance to the reference literature.
Author:
Publisher:
Published: 2006
Total Pages: 254
ISBN-13:
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