Atomic Layer Deposition Applications 3
Author: Ana Londergan
Publisher: The Electrochemical Society
Published: 2007
Total Pages: 300
ISBN-13: 1566775736
DOWNLOAD EBOOKThe continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.