Atomic Layer Deposition Applications 2
Atomic Layer Deposition Applications 2

Author: Ana Londergan

Publisher: The Electrochemical Society

Published: 2007

Total Pages: 300

ISBN-13: 1566775426

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This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.

Atomic Layer Deposition in Energy Conversion Applications
Atomic Layer Deposition in Energy Conversion Applications

Author: Julien Bachmann

Publisher: John Wiley & Sons

Published: 2017-03-15

Total Pages: 366

ISBN-13: 3527694838

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Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Atomic Layer Deposition
Atomic Layer Deposition

Author: Tommi Kääriäinen

Publisher: John Wiley & Sons

Published: 2013-05-28

Total Pages: 274

ISBN-13: 1118062779

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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition for Semiconductors
Atomic Layer Deposition for Semiconductors

Author: Cheol Seong Hwang

Publisher: Springer Science & Business Media

Published: 2013-10-18

Total Pages: 266

ISBN-13: 146148054X

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Atomic Layer Deposition of Nanostructured Materials
Atomic Layer Deposition of Nanostructured Materials

Author: Nicola Pinna

Publisher: John Wiley & Sons

Published: 2012-09-19

Total Pages: 463

ISBN-13: 3527639926

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Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Chemical Vapor Deposition for Nanotechnology
Chemical Vapor Deposition for Nanotechnology

Author: Pietro Mandracci

Publisher: BoD – Books on Demand

Published: 2019-01-10

Total Pages: 166

ISBN-13: 1789849608

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Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Organometallic Chemistry
Organometallic Chemistry

Author: Nathan J Patmore

Publisher: Royal Society of Chemistry

Published: 2018-11-16

Total Pages: 210

ISBN-13: 1788010671

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With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.

Handbook of Manufacturing Engineering and Technology
Handbook of Manufacturing Engineering and Technology

Author: Andrew Y. C. Nee

Publisher: Springer

Published: 2014-10-31

Total Pages: 0

ISBN-13: 9781447146698

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The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Chemical Vapour Deposition
Chemical Vapour Deposition

Author: Anthony C. Jones

Publisher: Royal Society of Chemistry

Published: 2009

Total Pages: 600

ISBN-13: 0854044655

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"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Shape Memory Alloys for Biomedical Applications
Shape Memory Alloys for Biomedical Applications

Author: T Yoneyama

Publisher: Elsevier

Published: 2008-11-21

Total Pages: 354

ISBN-13: 1845695240

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Shape memory alloys are suitable for a wide range of biomedical applications, such as dentistry, bone repair and cardiovascular stents. Shape memory alloys for biomedical applications provides a comprehensive review of the use of shape memory alloys in these and other areas of medicine.Part one discusses fundamental issues with chapters on such topics as mechanical properties, fabrication of materials, the shape memory effect, superelasticity, surface modification and biocompatibility. Part two covers applications of shape memory alloys in areas such as stents and orthodontic devices as well as other applications in the medical and dental fields.With its distinguished editors and international team of contributors, Shape memory alloys for biomedical applications is an essential reference for materials scientists and engineers working in the medical devices industry and in academia. - A comprehensive review of shape memory metals and devices for medical applications - Discusses materials, mechanical properties, surface modification and biocompatibility - Chapters review medical and dental devices using shape memory metals, including stents and orthodontic devices