ULSI Science and Technology, 1991
Author: John M. Andrews
Publisher:
Published: 1991
Total Pages: 962
ISBN-13:
DOWNLOAD EBOOKRead and Download eBook Full
Author: John M. Andrews
Publisher:
Published: 1991
Total Pages: 962
ISBN-13:
DOWNLOAD EBOOKAuthor: Hisham Z. Massoud
Publisher: The Electrochemical Society
Published: 1997
Total Pages: 686
ISBN-13: 9781566771306
DOWNLOAD EBOOKAuthor: Richard E. Novak
Publisher: The Electrochemical Society
Published: 1996
Total Pages: 642
ISBN-13: 9781566771153
DOWNLOAD EBOOKAuthor: Iqbal Ali
Publisher: The Electrochemical Society
Published: 1997
Total Pages: 294
ISBN-13: 9781566771726
DOWNLOAD EBOOKAuthor: Kenneth A. Jackson
Publisher: John Wiley & Sons
Published: 2008-11-21
Total Pages: 210
ISBN-13: 3527611797
DOWNLOAD EBOOKSilicon is the most important material for the electronics industry. In modern microelectronics silicon devices like diodes and transistors play a major role, and devices like photodetectors or solar cells gain ever more importance. This concise handbook deals with one of the most important topics for the electronics industry. World renowned authors have contributed to this unique overview of the processing of silicon and silicon devices.
Author: Howard R. Huff
Publisher: The Electrochemical Society
Published: 1998
Total Pages: 894
ISBN-13: 9781566771931
DOWNLOAD EBOOKAuthor: Dennis N. Schmidt
Publisher: The Electrochemical Society
Published: 1994
Total Pages: 454
ISBN-13: 9781566770415
DOWNLOAD EBOOKAuthor:
Publisher:
Published: 1998
Total Pages: 894
ISBN-13:
DOWNLOAD EBOOKAuthor: Richard B. Fair
Publisher: Academic Press
Published: 2012-12-02
Total Pages: 441
ISBN-13: 0323139809
DOWNLOAD EBOOKThis is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Author: C. Y. Chang
Publisher: McGraw-Hill Science, Engineering & Mathematics
Published: 1996
Total Pages: 756
ISBN-13:
DOWNLOAD EBOOK"This text follows the tradition of Sze's highly successful pioneering text on VLSI technology and is updated with the latest advances in the field of microelectronic chip fabrication. Since computer chips are foundations of modern electronics, these topics are essential for the next generation of USLI technologies, allowing more transistors to be packaged on a single chip. Contributing to each chapter are industry experts, specializing in topics such as epitaxy with low temperature process, rapid thermal processes, low damage plasma reactive ion etching, fine line litography, cleaning technology, clean room technology, packing and reliability."--