Thin Films for Integrated Optics Applications: Volume 392
Thin Films for Integrated Optics Applications: Volume 392

Author: Bruce W. Wessels

Publisher:

Published: 1995-10-19

Total Pages: 312

ISBN-13:

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The combination of electro-optic (EO) thin films with silicon-integrated circuits provides a promising approach to creating optoelectronic integrated circuits (OEICs) capable of sending information at data rates greater than 1 Gbit/second with low power consumption. These devices are of two basic types - very highly parallel (64K channels or greater) or very high speed (Gbits/ second/channel). Materials scientists, chemists and physicists come together in this new volume to discuss EO thin-film materials and devices, and to learn about advances in fields outside of their specific areas. Electro-optic materials featured include organic polymers and/or multilayers, liquid crystals, and inorganic thin films. Materials design, processing, and device issues are addressed. Topics include: nonlinear organics; liquid crystals for integrated optics; ferroelectric thin films; Er-doped inorganic thin films; inorganic thin film waveguides.

Polymers for Photonics Applications I
Polymers for Photonics Applications I

Author: K.-S. Lee

Publisher: Springer

Published: 2003-07-03

Total Pages: 273

ISBN-13: 3540446087

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The two special volumes of Advances in Polymer Science entitled "Polymers for Photonics Applications" provide authoritative and critical reviews of up-to-date research and advances in various fields of photonic polymers as well as their promising applications. Eight articles contributed by internationally recognized scientists are concerned with polymers for second- and third-order nonlinear optics, quadratic parametric interactions in polymer waveguides, electroluminescent polymers for light sources, photoreflective polymers for holographic information storage, and highly efficient two-photon absorbing organics and polymers, including their applications. This review should provide individuals working in the field of photonic polymers with invaluable scientific knowledge on the state of the art while giving directions for future research to those deeply interested.

Modeling and Simulation of Thin-Film Processing: Volume 389
Modeling and Simulation of Thin-Film Processing: Volume 389

Author: David J. Srolovitz

Publisher:

Published: 1995-10-02

Total Pages: 408

ISBN-13:

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A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.

Epitaxial Oxide Thin Films II: Volume 401
Epitaxial Oxide Thin Films II: Volume 401

Author: James S. Speck

Publisher:

Published: 1996-03-29

Total Pages: 588

ISBN-13:

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Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.

Structure and Properties of Multilayered Thin Films: Volume 382
Structure and Properties of Multilayered Thin Films: Volume 382

Author: Tai D. Nguyen

Publisher:

Published: 1995-11-10

Total Pages: 520

ISBN-13:

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Layered thin film structures often have unusual properties which make them appealing in a wide range of applications. Fabrication of submicron and nanometer multilayers can produce metastable phases that many not be predicted from the bulk equilibrium phase diagrams. Understanding the growth, structure, stability and properties of multilayers, and controlling their microstructure through processing, are important in many applications. This book focuses on the relationship of structure and processing to the properties that are relevant to all researchers in the field of multilayers. Topics include: phase transformation and reaction kinetics; processing and growth; structural characterization; magnetic, electronic and optical properties; mechanical properties; X-ray optics; thin-film interfaces.

Silicide Thin Films: Volume 402
Silicide Thin Films: Volume 402

Author: Raymond T. Tung

Publisher:

Published: 1996

Total Pages: 680

ISBN-13:

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Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.