Structure and Electronic Properties of Ultrathin In Films on Si(111)
Structure and Electronic Properties of Ultrathin In Films on Si(111)

Author: Shigemi Terakawa

Publisher: Springer Nature

Published: 2022-11-07

Total Pages: 83

ISBN-13: 9811968721

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This book reports the establishment of a single-atomic layer metal of In and a novel (In, Mg) ultrathin film on Si(111) surfaces. A double-layer phase of In called “rect” has been extensively investigated as a two-dimensional metal. Another crystalline phase called “hex” was also suggested, but it had not been established due to difficulty in preparing the sample. The author succeeded in growing the large and high-quality sample of the hex phase and revealed that it is a single-layer metal. The author also established a new triple-atomic layer (In, Mg) film with a nearly freestanding character by Mg deposition onto the In double layer. This work proposes a novel method to decouple ultrathin metal films from Si dangling bonds. The present study demonstrates interesting properties of indium itself, which is a p-block metal both with metallicity and covalency. In this book, readers also see principles of various surface analysis techniques and learn how to use them and analyze the results in the real systems. This book is useful to researchers and students interested in surface science, particularly ultrathin metal films on semiconductor surfaces.

Structure and Electronic Properties of Ultrathin In Films on Si(111)
Structure and Electronic Properties of Ultrathin In Films on Si(111)

Author: Shigemi Terakawa

Publisher:

Published: 2022

Total Pages: 0

ISBN-13: 9789811968730

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This book reports the establishment of a single-atomic layer metal of In and a novel (In, Mg) ultrathin film on Si(111) surfaces. A double-layer phase of In called "rect" has been extensively investigated as a two-dimensional metal. Another crystalline phase called "hex" was also suggested, but it had not been established due to difficulty in preparing the sample. The author succeeded in growing the large and high-quality sample of the hex phase and revealed that it is a single-layer metal. The author also established a new triple-atomic layer (In, Mg) film with a nearly freestanding character by Mg deposition onto the In double layer. This work proposes a novel method to decouple ultrathin metal films from Si dangling bonds. The present study demonstrates interesting properties of indium itself, which is a p-block metal both with metallicity and covalency. In this book, readers also see principles of various surface analysis techniques and learn how to use them and analyze the results in the real systems. This book is useful to researchers and students interested in surface science, particularly ultrathin metal films on semiconductor surfaces.

Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592
Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592

Author: D. A. Buchanan

Publisher: Mrs Proceedings

Published: 2000-10-17

Total Pages: 408

ISBN-13:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.

Monatomic Two-Dimensional Layers
Monatomic Two-Dimensional Layers

Author: Iwao Matsuda

Publisher: Elsevier

Published: 2018-08-22

Total Pages: 234

ISBN-13: 0128141611

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Monatomic Two-Dimensional Layers: Properties, Fabrication and Industrial Applications provides a detailed examination on basic principles and state-of-the-art experimental techniques for monatomic layers on model surfaces, and in operating devices. Both conventional surface science and novel 2D materials science are included. The reader is guided through an introduction to the basic science of the field that is followed by advanced science specific to the system. Characterization techniques, the principles of state-of-the-art instruments for monatomic layers, and topics, including positron diffraction, time-resolved photoemission spectroscopy, surface transport measurements, and operando nanospectroscopy are also covered. Researchers, graduate students and professionals will find this volume invaluable to acquire a deeper knowledge of the basic science, preparation, and experimental characterization techniques for 2D materials. Industrial technicians and operators will find it a useful overview of surface science related methods for fabrication and characterization of 2D materials. - Gives comprehensive access to the properties of 2D materials, selected fabrication methods, and advanced characterization tools - Discusses structure analysis by diffraction methods and 'operando' spectroscopy to provide direct information on device performance for industrial applications - Written by authors who developed the techniques and have conducted extensive research on monatomic layers

Oxide Ultrathin Films
Oxide Ultrathin Films

Author: Gianfranco Pacchioni

Publisher: John Wiley & Sons

Published: 2012-09-19

Total Pages: 368

ISBN-13: 3527640193

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A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices

Thin Film Materials And Devices: Developments In Science And Technology: Proceedings Of The Tenth International School
Thin Film Materials And Devices: Developments In Science And Technology: Proceedings Of The Tenth International School

Author: J M Marshall

Publisher: World Scientific

Published: 1999-06-01

Total Pages: 582

ISBN-13: 9814543705

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This volume constitutes the proceedings of the tenth meeting of the International school on Condensed Matter Physics. Since 1980, this community of condensed matter scientists has gathered in Varna, Bulgaria, every two years, to review and discuss the development of various investigations in the field, to present the latest results, and to outline the most important trends in condensed matter science.The book reflects the development of the field, and points to the growing interest in the application of theoretical achievements and to the mutual inspirations of science and technology.

Silicon Nanomaterials Sourcebook
Silicon Nanomaterials Sourcebook

Author: Klaus D. Sattler

Publisher: CRC Press

Published: 2017-07-28

Total Pages: 643

ISBN-13: 1498763871

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This comprehensive tutorial guide to silicon nanomaterials spans from fundamental properties, growth mechanisms, and processing of nanosilicon to electronic device, energy conversion and storage, biomedical, and environmental applications. It also presents core knowledge with basic mathematical equations, tables, and graphs in order to provide the reader with the tools necessary to understand the latest technology developments. From low-dimensional structures, quantum dots, and nanowires to hybrid materials, arrays, networks, and biomedical applications, this Sourcebook is a complete resource for anyone working with this materials: Covers fundamental concepts, properties, methods, and practical applications. Focuses on one important type of silicon nanomaterial in every chapter. Discusses formation, properties, and applications for each material. Written in a tutorial style with basic equations and fundamentals included in an extended introduction. Highlights materials that show exceptional properties as well as strong prospects for future applications. Klaus D. Sattler is professor physics at the University of Hawaii, Honolulu, having earned his PhD at the Swiss Federal Institute of Technology (ETH) in Zurich. He was honored with the Walter Schottky Prize from the German Physical Society, and is the editor of the sister work also published by Taylor & Francis, Carbon Nanomaterials Sourcebook, as well as the acclaimed multi-volume Handbook of Nanophysics.

Silicon Materials
Silicon Materials

Author: Beddiaf Zaidi

Publisher: BoD – Books on Demand

Published: 2019-08-07

Total Pages: 194

ISBN-13: 1789846587

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Apart from oxygen, silicon is the most commonly occurring element on Earth. Silicon materials have many applications in the manufacturing technology of microelectronic components, integrated circuits, and photovoltaic generators. Circuit complexity and higher degrees of integration of components require constant improvement and control of silicon's properties. This book provides information on silicon materials, their use, and their impact on the modern world economy.

Auger Electron Spectroscopy
Auger Electron Spectroscopy

Author: Donald T. Hawkins

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 305

ISBN-13: 1468413872

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Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.