Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592
Structure and Electronic Properties of Ultrathin Dielectric Films on Silicon and Related Structures: Volume 592

Author: D. A. Buchanan

Publisher: Mrs Proceedings

Published: 2000-10-17

Total Pages: 408

ISBN-13:

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. The book, first published in 2000, includes detailed theoretical studies of the nature of SiO2 and its interface with silicon, electron paramagnetic resonance for the study of defects, electron tunneling, and band alignment among others.

Rapid Thermal and Other Short-time Processing Technologies
Rapid Thermal and Other Short-time Processing Technologies

Author: Fred Roozeboom

Publisher: The Electrochemical Society

Published: 2000

Total Pages: 482

ISBN-13: 9781566772747

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The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.

Oxide Reliability
Oxide Reliability

Author: D. J. Dumin

Publisher: World Scientific

Published: 2002

Total Pages: 292

ISBN-13: 9789810248420

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Presents in summary the state of our knowledge of oxide reliability.

Thermoelectric Materials 2000 - The Next Generation Materials for Small-Scale Refrigeration and Power Generation Applications: Volume 626
Thermoelectric Materials 2000 - The Next Generation Materials for Small-Scale Refrigeration and Power Generation Applications: Volume 626

Author: Terry M. Tritt

Publisher:

Published: 2001-03

Total Pages: 434

ISBN-13:

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The presentations from the symposium are grouped into the following topics: skutterudites, superlattice, new materials, quantum wires and dots, half-heusler alloys and quasicrystals, TE theory, thermionics, clathrates, and thin films TE. In addition, poster sessions include the following: semiconductors with tetrahedral anions as potential thermoelectric materials, lattice dynamics study of anisotropic heat conduction in supperlattices, structure and thermoelectric properties of new quaternary tin and lead Bismuth selenides, attributes of the Seebeck coefficient of Bismuth microwire array composites, and High-Z Lanthanum-Cerium Hexaborate thin films for low-temperature applications. c. Book News Inc.

Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices
Fundamental Aspects of Ultrathin Dielectrics on Si-based Devices

Author: Eric Garfunkel

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 503

ISBN-13: 9401150087

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An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.

High-k Gate Dielectrics for CMOS Technology
High-k Gate Dielectrics for CMOS Technology

Author: Gang He

Publisher: John Wiley & Sons

Published: 2012-08-10

Total Pages: 560

ISBN-13: 3527646361

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A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.