Introduction to Plasma Spectroscopy
Introduction to Plasma Spectroscopy

Author: Hans-Joachim Kunze

Publisher: Springer Science & Business Media

Published: 2009-09-18

Total Pages: 242

ISBN-13: 3642022332

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Although based on lectures given for graduate students and postgraduates starting in plasma physics, this concise introduction to the fundamental processes and tools is as well directed at established researchers who are newcomers to spectroscopy and seek quick access to the diagnostics of plasmas ranging from low- to high-density technical systems at low temperatures, as well as from low- to high-density hot plasmas. Basic ideas and fundamental concepts are introduced as well as typical instrumentation from the X-ray to the infrared spectral regions. Examples, techniques and methods illustrate the possibilities. This book directly addresses the experimentalist who actually has to carry out the experiments and their interpretation. For that reason about half of the book is devoted to experimental problems, the instrumentation, components, detectors and calibration.

Plasma Spectroscopy
Plasma Spectroscopy

Author: Takashi Fujimoto

Publisher: Clarendon Press

Published: 2004-06-17

Total Pages: 300

ISBN-13: 0191523895

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This book focuses on the characteristics of optical radiation, or a spectrum, emitted by various plasmas. In plasma, the same atomic species can produce quite different spectra, or colours, depending on the nature of the plasma. This book gives a theoretical framework by which a particular spectrum can be interpreted correctly and coherently. The uniqueness of the book lies in its comprehensive treatment of the intensity distribution of spectral lines and the population density distribution among the atomic levels in plasmas. It is intended to provide beginners with a good perspective of the field, laying out the physics in an extremely clear manner and starting from an elementary level. A useful feature of the book is the asterisked sections and chapters which can be skipped by readers who only wish to gain a quick and basic introduction to plasma spectroscopy. It will also be useful to researchers working actively in the field, acting as a guide for carrying out experiments and interpreting experimental observations.

Principles of Plasma Spectroscopy
Principles of Plasma Spectroscopy

Author: Hans R. Griem

Publisher:

Published: 1997

Total Pages: 366

ISBN-13: 9780521455046

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This is a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. It introduces the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects, and describes theoretical and experimental aspects of spectral line broadening. The book illustrates the concepts of continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The basics of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties are also explored. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation.

Optical Diagnostics for Thin Film Processing
Optical Diagnostics for Thin Film Processing

Author: Irving P. Herman

Publisher: Elsevier

Published: 1996-10-23

Total Pages: 815

ISBN-13: 0080538088

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This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic

Plasma Diagnostics
Plasma Diagnostics

Author: W. Lochte-Holtgreven

Publisher: American Institute of Physics

Published: 1995

Total Pages: 968

ISBN-13:

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Market: Plasma physicists and students. Upon publication in 1968, Plasma Diagnostics represented the most up- to-date survey of the experimental methods used in plasma analysis, including the necessary theoretical background. This work emphasizes spectroscopic techniques along with in-depth sections on laser techniques and electric and magnetic probe methods. The evaluation of collision and transport cross sections, heat and electrical conductivity, and viscosity are some of the many applications of plasma diagnostics reviewed as well. This long-awaited reprint volume is of interest to both physicists and students of theoretical physics as it deals with plasma theory from a fundamental point of view, stressing a careful derivation and discussion of the equations.

Cold Plasma in Food and Agriculture
Cold Plasma in Food and Agriculture

Author: NN Misra

Publisher: Academic Press

Published: 2016-07-15

Total Pages: 382

ISBN-13: 012801489X

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Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. - Examines the topic of cold plasma technology for food applications - Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality - Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods - Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field

Atmospheric Pressure Plasma
Atmospheric Pressure Plasma

Author: Anton Nikiforov

Publisher: BoD – Books on Demand

Published: 2019-04-24

Total Pages: 146

ISBN-13: 1838802495

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Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.

Reactive Sputter Deposition
Reactive Sputter Deposition

Author: Diederik Depla

Publisher: Springer Science & Business Media

Published: 2008-06-24

Total Pages: 584

ISBN-13: 3540766642

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In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Low Temperature Plasma Technology
Low Temperature Plasma Technology

Author: Paul K. Chu

Publisher: CRC Press

Published: 2013-07-15

Total Pages: 497

ISBN-13: 1466509902

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Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.