Semiconductor Silicon 1986
Author: Electrochemical Society. Electronics Division Electrochemical Society. Dielectrics and Insulation Division
Publisher:
Published: 1988
Total Pages: 1096
ISBN-13:
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Author: Electrochemical Society. Electronics Division Electrochemical Society. Dielectrics and Insulation Division
Publisher:
Published: 1988
Total Pages: 1096
ISBN-13:
DOWNLOAD EBOOKAuthor: Howard R. Huff
Publisher:
Published: 1986
Total Pages: 1096
ISBN-13:
DOWNLOAD EBOOKAuthor: Howard R. Huff
Publisher: The Electrochemical Society
Published: 1994
Total Pages: 1284
ISBN-13: 9781566770422
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Publisher:
Published: 1988
Total Pages:
ISBN-13: 9789999865449
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Publisher:
Published: 1998
Total Pages: 894
ISBN-13:
DOWNLOAD EBOOKAuthor: Howard R. Huff
Publisher: The Electrochemical Society
Published: 2002
Total Pages: 650
ISBN-13: 9781566773744
DOWNLOAD EBOOKAuthor: Fumio Shimura
Publisher: Elsevier
Published: 2012-12-02
Total Pages: 435
ISBN-13: 0323150489
DOWNLOAD EBOOKSemiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.
Author:
Publisher: Academic Press
Published: 1994-08-15
Total Pages: 711
ISBN-13: 0080864392
DOWNLOAD EBOOKThis volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen. Comprehensive study of the behavior of oxygen in silicon Discusses silicon crystals for VLSI and ULSI applications Thorough coverage from crystal growth to device fabrication Edited by technical experts in the field Written by recognized authorities from industrial and academic institutions Useful to graduate students, scientists in other disciplines, and active participants in the arena of silicon-based microelectronics research 297 original line drawings
Author: Stanley Wolf
Publisher:
Published: 2002
Total Pages: 0
ISBN-13:
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