A reference on semiconductor characterization tools, this volume offers explanations of the advanced and traditional techniques for evaluating different criterion: crystal defects, impurity concentration, lifetime, film thickness, resistivity, and such critical electrical properties as mobility, Hall effect, and conductivity type.
Crystal orientation. Crystallographic defects and their observation. Resistivity and carrier-concentration measurements. Lifetime. Mobility, hall, and type measurements. Thickness measurements. Preparation of samples for microscopic examination. Microscopy and photography. The electron microscope and other analytical instruments.
As we delve more deeply into the physics and chemistry of functional materials and processes, we are inexorably driven to the nanoscale. And nowhere is the development of instrumentation and associated techniques more important to scientific progress than in the area of nanoscience. The dramatic expansion of efforts to peer into nanoscale materials and processes has made it critical to capture and summarize the cutting-edge instrumentation and techniques that have become indispensable for scientific investigation in this arena. This Handbook is a key resource developed for scientists, engineers and advanced graduate students in which eminent scientists present the forefront of instrumentation and techniques for the study of structural, optical and electronic properties of semiconductor nanostructures.
This book describes the fundamental scientific principles underlying high quality instrumentation used for environmental measurements. It discusses a wide range of in situ sensors employed in practical environmental monitoring and, in particular, those used in surface based measurement systems. It also considers the use of weather balloons to provide a wealth of upper atmosphere data. To illustrate the technologies in use it includes many examples of real atmospheric measurements in typical and unusual circumstances, with a discussion of the electronic signal conditioning, data acquisition considerations and data processing principles necessary for reliable measurements. This also allows the long history of atmospheric measurements to be placed in the context of the requirements of modern climate science, by building the physical science appreciation of the instrumental record and looking forward to new and emerging sensor and recording technologies.
Measurement and Instrumentation: Theory and Application, Second Edition, introduces undergraduate engineering students to measurement principles and the range of sensors and instruments used for measuring physical variables. This updated edition provides new coverage of the latest developments in measurement technologies, including smart sensors, intelligent instruments, microsensors, digital recorders, displays, and interfaces, also featuring chapters on data acquisition and signal processing with LabVIEW from Dr. Reza Langari. Written clearly and comprehensively, this text provides students and recently graduated engineers with the knowledge and tools to design and build measurement systems for virtually any engineering application. Provides early coverage of measurement system design to facilitate a better framework for understanding the importance of studying measurement and instrumentation Covers the latest developments in measurement technologies, including smart sensors, intelligent instruments, microsensors, digital recorders, displays, and interfaces Includes significant material on data acquisition and signal processing with LabVIEW Extensive coverage of measurement uncertainty aids students’ ability to determine the accuracy of instruments and measurement systems
This Third Edition updates a landmark text with the latest findings The Third Edition of the internationally lauded Semiconductor Material and Device Characterization brings the text fully up-to-date with the latest developments in the field and includes new pedagogical tools to assist readers. Not only does the Third Edition set forth all the latest measurement techniques, but it also examines new interpretations and new applications of existing techniques. Semiconductor Material and Device Characterization remains the sole text dedicated to characterization techniques for measuring semiconductor materials and devices. Coverage includes the full range of electrical and optical characterization methods, including the more specialized chemical and physical techniques. Readers familiar with the previous two editions will discover a thoroughly revised and updated Third Edition, including: Updated and revised figures and examples reflecting the most current data and information 260 new references offering access to the latest research and discussions in specialized topics New problems and review questions at the end of each chapter to test readers' understanding of the material In addition, readers will find fully updated and revised sections in each chapter. Plus, two new chapters have been added: Charge-Based and Probe Characterization introduces charge-based measurement and Kelvin probes. This chapter also examines probe-based measurements, including scanning capacitance, scanning Kelvin force, scanning spreading resistance, and ballistic electron emission microscopy. Reliability and Failure Analysis examines failure times and distribution functions, and discusses electromigration, hot carriers, gate oxide integrity, negative bias temperature instability, stress-induced leakage current, and electrostatic discharge. Written by an internationally recognized authority in the field, Semiconductor Material and Device Characterization remains essential reading for graduate students as well as for professionals working in the field of semiconductor devices and materials. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department.
