Secondary Ion Mass Spectrometry
Secondary Ion Mass Spectrometry

Author: Paul van der Heide

Publisher: John Wiley & Sons

Published: 2014-08-19

Total Pages: 412

ISBN-13: 1118916778

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Serves as a practical reference for those involved in Secondary Ion Mass Spectrometry (SIMS) • Introduces SIMS along with the highly diverse fields (Chemistry, Physics, Geology and Biology) to it is applied using up to date illustrations • Introduces the accepted fundamentals and pertinent models associated with elemental and molecular sputtering and ion emission • Covers the theory and modes of operation of the instrumentation used in the various forms of SIMS (Static vs Dynamic vs Cluster ion SIMS) • Details how data collection/processing can be carried out, with an emphasis placed on how to recognize and avoid commonly occurring analysis induced distortions • Presented as concisely as believed possible with All sections prepared such that they can be read independently of each other

Secondary Ion Mass Spectrometry SIMS V
Secondary Ion Mass Spectrometry SIMS V

Author: Alfred Benninghoven

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 578

ISBN-13: 3642827241

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This volume contains the proceedings of the Fifth International Confer ence on Secondary Ion Mass Spectrometry (SIMS V), held at the Capitol Holiday Inn, Washington, DC, USA, from September 30 to October 4, 1985. The conference was the fifth in a series of conferences held bienni ally. Previous conferences were held in Miinster (1977), Stanford (1979), Budapest (1981), and Osaka (1983). SIMS V was organized by Dr. R.J. Colton of the Nayal Research Lab oratory and Dr. D.S. Simons of the National Bureau of Standards un der the auspices of the International Organizing Committee chaired by Prof. A. Benninghoven of the Universitat Miinster. Dr. Richard F.K. Herzog served as the honorary chairman of SIMS V. While Dr. Herzog is best known to the mass spectrometry community for his theoretical development of a mass spectrometer design, known as the Mattauch-Herzog geometry, he also made several early and impor tant contributions to SIMS. In 1949, Herzog and Viehbock published a description of the first instrument designed to study secondary ions pro duced by bombardment from a beam of ions generated in a source that was separated from the sample by a narrow tube. Later at the GCA Cor poration, he brought together a team of researchers including H.J. Liebl, F.G. Riidenauer, W.P. Poschenrieder and F.G. Satkiewicz, who designed and built, and carried out applied research with the first commercial ion microprobe.

An Introduction to Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and its Application to Materials Science
An Introduction to Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and its Application to Materials Science

Author: Sarah Fearn

Publisher: Morgan & Claypool Publishers

Published: 2015-10-16

Total Pages: 67

ISBN-13: 1681740885

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This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.

ToF-SIMS
ToF-SIMS

Author: J. C. Vickerman

Publisher: IM Publications

Published: 2013

Total Pages: 742

ISBN-13: 1906715173

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Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is the most versatile of the surface analysis techniques that have been developed during the last 30 years. This is the Second Edition of the first book ToF-SIMS: Surface analysis by Mass Spectrometry to be dedicated to the subject and the treatment is comprehensive

Cluster Secondary Ion Mass Spectrometry
Cluster Secondary Ion Mass Spectrometry

Author: Christine M. Mahoney

Publisher: John Wiley & Sons

Published: 2013-04-17

Total Pages: 325

ISBN-13: 1118589246

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Explores the impact of the latest breakthroughs in cluster SIMS technology Cluster secondary ion mass spectrometry (SIMS) is a high spatial resolution imaging mass spectrometry technique, which can be used to characterize the three-dimensional chemical structure in complex organic and molecular systems. It works by using a cluster ion source to sputter desorb material from a solid sample surface. Prior to the advent of the cluster source, SIMS was severely limited in its ability to characterize soft samples as a result of damage from the atomic source. Molecular samples were essentially destroyed during analysis, limiting the method's sensitivity and precluding compositional depth profiling. The use of new and emerging cluster ion beam technologies has all but eliminated these limitations, enabling researchers to enter into new fields once considered unattainable by the SIMS method. With contributions from leading mass spectrometry researchers around the world, Cluster Secondary Ion Mass Spectrometry: Principles and Applications describes the latest breakthroughs in instrumentation, and addresses best practices in cluster SIMS analysis. It serves as a compendium of knowledge on organic and polymeric surface and in-depth characterization using cluster ion beams. It covers topics ranging from the fundamentals and theory of cluster SIMS, to the important chemistries behind the success of the technique, as well as the wide-ranging applications of the technology. Examples of subjects covered include: Cluster SIMS theory and modeling Cluster ion source types and performance expectations Cluster ion beams for surface analysis experiments Molecular depth profiling and 3-D analysis with cluster ion beams Specialty applications ranging from biological samples analysis to semiconductors/metals analysis Future challenges and prospects for cluster SIMS This book is intended to benefit any scientist, ranging from beginning to advanced in level, with plenty of figures to help better understand complex concepts and processes. In addition, each chapter ends with a detailed reference set to the primary literature, facilitating further research into individual topics where desired. Cluster Secondary Ion Mass Spectrometry: Principles and Applications is a must-have read for any researcher in the surface analysis and/or imaging mass spectrometry fields.

Secondary Ion Mass Spectrometry
Secondary Ion Mass Spectrometry

Author: J. C. Vickerman

Publisher: Oxford University Press, USA

Published: 1989

Total Pages: 368

ISBN-13:

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This book provides an overview of the phenomenology, technology and application of secondary ion mass spectrometry as a technique for materials analysis. This approach is developing into one of the most effective methods of characterizing the composition and chemical state of the surface and sub-surface layers of solid materials. The first three chapters introduce the basic physical and chemical principles involved and the theories which have been proposed to explain the process. Subsequent chapters describe the instrumental components of the SIMS apparatus, the use of SIMS as an analytical tool, and the development of the techniques of sputtered neutral mass spectrometry and laser microprobe and plasma desorption mass spectrometry. Many practical examples are featured to illustrate the application of SIMS to real problems, possible pitfalls are pointed out, and data of use to analysts are collected in appendices. The book is a practical guide suitable for scientists in all fields who wish to use this valuable analytical technique.

Chemical Imaging Analysis
Chemical Imaging Analysis

Author: Freddy Adams

Publisher: Elsevier

Published: 2015-06-06

Total Pages: 493

ISBN-13: 0444634509

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Chemical Imaging Analysis covers the advancements made over the last 50 years in chemical imaging analysis, including different analytical techniques and the ways they were developed and refined to link the composition and structure of manmade and natural materials at the nano/micro scale to the functional behavior at the macroscopic scale. In a development process that started in the early 1960s, a variety of specialized analytical techniques was developed – or adapted from existing techniques – and these techniques have matured into versatile and powerful tools for visualizing structural and compositional heterogeneity. This text explores that journey, providing a general overview of imaging techniques in diverse fields, including mass spectrometry, optical spectrometry including X-rays, electron microscopy, and beam techniques. - Provides comprehensive coverage of analytical techniques used in chemical imaging analysis - Explores a variety of specialized techniques - Provides a general overview of imaging techniques in diverse fields

Secondary Ion Mass Spectrometry
Secondary Ion Mass Spectrometry

Author: Robert G. Wilson

Publisher: Wiley-Interscience

Published: 1989-11-16

Total Pages: 392

ISBN-13:

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Seco ndary Ion Mass Spectrometry Basic Concepts, Instrumental Aspects, Applications and Trends (Volume 86 in Chemical Analysis: A Series of Monographs on Analytical Chemistry and Its Applications) A. Benninghoven, F. G. Rüdenauer, and H. W. Werner "[This book] is (and probably will be for a long time ahead) the standard book on secondary ion mass spectrometry." —Trends in Analytical Chemistry "This is a monumental work, and contains nearly 600 illustrations and over 2,000 references covering nearly all the essential published information up to 1985. The book will certainly find its place as a reference work in most laboratories using this methodology" —Analytica Chimica Acta 1987 (0 471-01056-1) 1,227 pp. Secondary Ion Mass Spectrometry Proceedings of the Sixth International Conference on Secondary Ion Mass Spectrometry (SIMS VI) Edited by A. Benninghoven, A.M. Huber, and H. W. Werner "The international SIMS conferences have been held every two years since 1977. They are recognized as one of the major forums for scientists, instrument manufacturers, and other researchers actively engaged in this rapidly expanding field…this volume is a valuable account of the latest advances in the field of SIMS, and of the research trends of some of the most respected experts in the field.…it is recommended for the libraries of all academic and industrial institutions where SIMS research is ongoing.…it should prove a valuable reference source for years to come." —Applied Spectroscopy 1988 (0 471-91832-6) 1,078 pp.

Secondary Ion Mass Spectrometry SIMS XI
Secondary Ion Mass Spectrometry SIMS XI

Author: G. Gillen

Publisher: Wiley

Published: 1998-03-06

Total Pages: 1150

ISBN-13: 9780471978268

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This volume contains 252 contributions presented as plenary,invited and contributed poster and oral presentations at the 11thInternational Conference on Secondary Ion Mass Spectrometry (SIMSXI) held at the Hilton Hotel, Walt Disney World Village, Orlando,Florida, 7 12 September, 1997. The book covers a diverse range ofresearch, reflecting the rapid growth in advanced semiconductorcharacterization, ultra shallow depth profiling, TOF-SIMS and thenew areas in which SIMS techniques are being used, for example inbiological sciences and organic surface characterization. Papersare presented under the following categories: * Isotopic SIMS * Biological SIMS * Semiconductor Characterization Techniques and Applications * Ultra Shallow Depth Profiling * Depth Profiling Fundamental/Modelling and Diffusion * Sputter-Induced Topography * Fundamentals of Molecular Desorption * Organic Materials * Practical TOF-SIMS * Polyatomic Primary Ions * Materials/Surface Analysis * Postionization * Instrumentation * Geological SIMS * Imaging * Fundamentals of Sputtering * Ion Formation and Cluster Formation * Quantitative Analysis Environmental/ParticleCharacterization * Related Techniques These proceedings provide an invaluable source of reference forboth newcomers to the field and experienced SIMS users.