This research monograph discusses the close correlation between the magnetic and structural properties of thin films in the context of numerous examples of epitaxial metal films, while emphasis is laid on the stabilization of novel structures compared to the bulk material. Further options, possibilities, and limits for applications are given. Techniques for the characterization of thin films are addressed as well.
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures. Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
Offering perspective on both the scientific and engineering aspects of 2D semiconductors, Ultrathin Two-Dimensional Semiconductors for Novel Electronic Applications discusses how to successfully engineer 2D materials for practical applications. It also covers several novel topics regarding 2D semiconductors which have not yet been discussed in any other publications. Features: Provides comprehensive information and data about wafer-scale deposition of 2D semiconductors, ranging from scientific discussions up to the planning of experiments and reliability testing of the fabricated samples Precisely discusses wafer-scale ALD and CVD of 2D semiconductors and investigates various aspects of deposition techniques Covers the new group of 2D materials synthesized from surface oxide of liquid metals and also explains the device fabrication and post-treatment of these 2D nanostructures Addresses a wide range of scientific and practical applications of 2D semiconductors and electronic and optoelectronic devices based on these nanostructures Offers novel coverage of 2D heterostructures and heterointerfaces and provides practical information about fabrication and application of these heterostructures Introduces the latest advancement in fabrication of novel memristors, artificial synapses and sensorimotor devices based on 2D semiconductors This work offers practical information valuable for engineering applications that will appeal to researchers, academics, and scientists working with and interested in developing an array of semiconductor electronic devices.
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures.Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices.Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.
This book presents the state of the art in nanoscale surface physics. It outlines contemporary trends in the field covering a wide range of topical areas: atomic structure of surfaces and interfaces, molecular films and polymer adsorption, biologically inspired nanophysics, surface design and pattern formation, and computer modeling of interfacial phenomena. Bridging "classical" and "nano" concepts, the present volume brings attention to the physical background of exotic condensed-matter properties. The book is devoted to Iwan Stranski and Rostislaw Kaischew, remarkable scientists, who played a crucial role in setting up the theoretical fundamentals of nucleation and crystal growth phenomena in the last century.
This book deals with basic physical properties related to the nonlinear interaction of light and matter. Nonlinear effects in atomic (molecular) systems and condensed matter are described, and classical phenomena as well as phenomena requiring a field-quantised description are covered. Leading authorities in nonlinear optics have reviewed themes of current interest in the research literature, and described general principles of importance for newcomers to the field.
With an in-depth exploration of the following topics, this book covers the broad uses of zinc oxide within the fields of materials science and engineering: - Recent advances in bulk, thin film and nanowire growth of ZnO (including MBE, MOCVD and PLD), - The characterization of the resulting material (including the related ternary systems ZgMgO and ZnCdO), - Improvements in device processing modules (including ion implantation for doping and isolation, Ohmic and Schottky contacts, wet and dry etching), - The role of impurities and defects on materials properties - Applications of ZnO in UV light emitters/detectors, gas, biological and chemical-sensing, transparent electronics, spintronics and thin film
Fully Depleted Silicon-On-Insulator provides an in-depth presentation of the fundamental and pragmatic concepts of this increasingly important technology. There are two main technologies in the marketplace of advanced CMOS circuits: FinFETs and fully depleted silicon-on-insulators (FD-SOI). The latter is unchallenged in the field of low-power, high-frequency, and Internet-of-Things (IOT) circuits. The topic is very timely at research and development levels. Compared to existing books on SOI materials and devices, this book covers exhaustively the FD-SOI domain. Fully Depleted Silicon-On-Insulator is based on the expertise of one of the most eminent individuals in the community, Dr. Sorin Cristoloveanu, an IEEE Andrew Grove 2017 award recipient "For contributions to silicon-on-insulator technology and thin body devices." In the book, he shares key insights on the technological aspects, operation mechanisms, characterization techniques, and most promising emerging applications. Early praise for Fully Depleted Silicon-On-Insulator "It is an excellent written guide for everyone who would like to study SOI deeply, specially focusing on FD-SOI." --Dr. Katsu Izumi, Formerly at NTT Laboratories and then at Osaka Prefecture University, Japan "FDSOI technology is poised to catch an increasingly large portion of the semiconductor market. This book fits perfectly in this new paradigm [...] It covers many SOI topics which have never been described in a book before." --Professor Jean-Pierre Colinge, Formerly at TSMC and then at CEA-LETI, Grenoble, France "This book, written by one of the true experts and pioneers in the silicon-on-insulator field, is extremely timely because of the growing footprint of FD-SOI in modern silicon technology, especially in IoT applications. Written in a delightfully informal style yet comprehensive in its coverage, the book describes both the device physics underpinning FD-SOI technology and the cutting-edge, perhaps even futuristic devices enabled by it." --Professor Alexander Zaslavsky, Brown University, USA "A superbly written book on SOI technology by a master in the field." --Professor Yuan Taur, University of California, San Diego, USA "The author is a world-top researcher of SOI device/process technology. This book is his masterpiece and important for the FD-SOI archive. The reader will learn much from the book." --Professor Hiroshi Iwai, National Yang Ming Chiao Tung University, Taiwan From the author "It is during our global war against the terrifying coalition of corona and insidious computer viruses that this book has been put together. Continuous enlightenment from FD-SOI helped me cross this black and gray period. I shared a lot of myself in this book. The rule of the game was to keep the text light despite the heavy technical content. There are even tentative FD-SOI hieroglyphs on the front cover, composed of curves discussed in the book." - Written by a top expert in the silicon-on-insulator community and IEEE Andrew Grove 2017 award recipient - Comprehensively addresses the technology aspects, operation mechanisms and electrical characterization techniques for FD-SOI devices - Discusses FD-SOI's most promising device structures for memory, sensing and emerging applications
