Formation of Semiconductor Interfaces: Proceedings of the Fifth International Conference on the Formation of Semiconductor Interfaces, Princeton, NJ, USA, June 26-30,1995
Formation of Semiconductor Interfaces: Proceedings of the Fifth International Conference on the Formation of Semiconductor Interfaces, Princeton, NJ, USA, June 26-30,1995

Author:

Publisher:

Published: 1996

Total Pages: 732

ISBN-13:

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This special volume contains the proceedings of the Fifth International Conference on the Formation of Semiconductor Interfaces. This fifth edition of the conference is aimed at providing a review of state of the art experimental and theoretical research on structural and electronic properties of semiconductor interfaces. The scientific program focused on various aspects of (1) semiconductor nanostructures, (2) thin insulators on semiconductors, (3) highly lattice mismatched heterostructures, (4) passivation and surfactants, (5) atom manipulation on semiconductor surfaces, (6) wide band gap semiconductors, (7) interfaces of organic semiconductors, (8) semiconductor heterojunctions, (9) metal semiconductor interfaces, as well as (10) clean surfaces and adsorbates.

Formation Of Semiconductor Interfaces - Proceedings Of The 4th International Conference
Formation Of Semiconductor Interfaces - Proceedings Of The 4th International Conference

Author: J Pollman

Publisher: World Scientific

Published: 1994-06-09

Total Pages: 818

ISBN-13: 9814552399

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Semiconductor interfaces are of paramount importance in micro, nano- and optoelectronics. Basic as well as applied research on such systems is therefore of extremely high current interest. To meet the continuous need for a better understanding of semiconductor interfaces with respect to both their fundamental physical and chemical properties as well as their applications in modern opto- and microelectronics, the series of international conferences on the formation of semiconductor interfaces was begun. The fourth conference of the series held in Jülich addresses as main topics: clean semiconductor surfaces; adsorbates at semiconductor surfaces; metal-semiconductor, insulator-semiconductor and semiconductor-semiconductor interfaces; devices and wet chemical processes. The 12 invited lectures assess the present status of the research in important areas and about 180 contributed papers describe most recent achievements in the field.