Introduction to Integrated Optics
Introduction to Integrated Optics

Author: Michael Barnoski

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 522

ISBN-13: 1468420828

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The material presented in this volume is based on a series of lectures presented at an annual short course entitled "Integrated Optics" sponsored by the University of Cali fornia, Santa Barbara, in March of 1973. Each chapter has been authored by the individual lecturing on the particular subject matter con tained in that chapter. The primary intent of this book is to pro vide the students with a written version of the lecture material. The text treats a large variety of the basic structures and analysis techniques currently being employed in the rapidly growing area of technology termed "Integrated Optics." The volume contains both material that has previously been published in scientific journals and material which has not been published elsewhere. Since the field of integrated optics is in a stage of rapid expansion, a complete coverage of all the experimental results is difficult. As a result the emphasis is placed on the funda mental theoretical ideas and experimental results. The editor gratefully acknowledges the con tributing authors and the institutions with which they are associated for their wholehearted cooperation in the preparation of this book. Particular thanks are extended to the Hughes Research Laboratories, a division of the Hughes Aircraft Company.

EUV Lithography
EUV Lithography

Author: Vivek Bakshi

Publisher: SPIE Press

Published: 2009

Total Pages: 704

ISBN-13: 0819469645

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Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop
Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop

Author: Vitor Baranauskas

Publisher: World Scientific

Published: 1990-05-01

Total Pages: 194

ISBN-13: 9814611905

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This volume is a collection of classical and recent empirical studies of currency options and their implications for issues of exchange rate economics, such as exchange rate risk premium, volatility, market expectations, and credibility of exchange rate regimes. It contains applications on how to extract useful information from option market data for financial forecasting policy purposes. The subjects are discussed in a self-contained, user-friendly format, with introductory chapters on currency option theory and currency option markets.The book can be used as supplementary reading for graduate finance and international economics courses, as training material for central bank and regulatory authorities, or as a reference book for financial analysts.