Plasma Electronics, Second Edition
Plasma Electronics, Second Edition

Author: Toshiaki Makabe

Publisher: CRC Press

Published: 2014-08-27

Total Pages: 414

ISBN-13: 1482222051

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Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.

Plasma Electronics
Plasma Electronics

Author: Toshiaki Makabe

Publisher: CRC Press

Published: 2006-03-27

Total Pages: 355

ISBN-13: 1420012274

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Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,

Plasma Electronics
Plasma Electronics

Author: Toshiaki Makabe

Publisher: CRC Press

Published: 2006-03-27

Total Pages: 360

ISBN-13: 9780750309769

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Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts. Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.

Plasma Physics and Engineering
Plasma Physics and Engineering

Author: Alexander Fridman

Publisher: CRC Press

Published: 2004-04-15

Total Pages: 888

ISBN-13: 9781560328483

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Plasma engineering is a rapidly expanding area of science and technology with increasing numbers of engineers using plasma processes over a wide range of applications. An essential tool for understanding this dynamic field, Plasma Physics and Engineering provides a clear, fundamental introduction to virtually all aspects of modern plasma science and technology, including plasma chemistry and engineering, combustion, chemical physics, lasers, electronics, methods of material treatment, fuel conversion, and environmental control. The book contains an extensive database on plasma kinetics and thermodynamics, many helpful numerical formulas for practical calculations, and an array of problems and concept questions.

Plasma Physics and Plasma Electronics
Plasma Physics and Plasma Electronics

Author: L. M. Kovrizhnykh

Publisher:

Published: 1989

Total Pages: 330

ISBN-13:

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Fourteen technical reports of research activity at (what used to the called) the Lebedev Physics Institute. Most of the research derives from stellarator work. The Russian edition appeared in 1985. Production work acceptable, though the crispness of the printing is surpassed by most newspapers. (NW)

Plasma Antennas, Second Edition
Plasma Antennas, Second Edition

Author: Theodore Anderson

Publisher: Artech House

Published: 2020-11-30

Total Pages: 350

ISBN-13: 1630817511

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This updated edition of an Artech House classic contains steering, focusing, and spreading of antenna beams using the physics of refraction of electromagnetic waves through a plasma. Pulsing circuitry for ionizing plasma antennas with low power requirements are covered. New and improved smart plasma antenna and applications to wi-fi and the applications of plasma antennas are discussed. Experimental work on plasma antenna noise and new progress on ruggedization and custom-made plasma tubes are also presented. This unique resource provides readers with a solid understanding of the efficient design and prototype development of plasma antennas to meet the challenge of reducing the power required to ionize the gas at various plasma densities. Thorough coverage of the technical underpinnings of plasma antennas, as well as important discussions on current markets and applications are discussed. Additionally, the book presents experimental work in this cutting-edge area and reveals the latest developments in the field.

Lecture Notes on Principles of Plasma Processing
Lecture Notes on Principles of Plasma Processing

Author: Francis F. Chen

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 213

ISBN-13: 1461501814

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Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.

Introduction to Plasma Physics and Controlled Fusion
Introduction to Plasma Physics and Controlled Fusion

Author: Francis F. Chen

Publisher: Springer Science & Business Media

Published: 2013-03-09

Total Pages: 427

ISBN-13: 1475755953

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TO THE SECOND EDITION In the nine years since this book was first written, rapid progress has been made scientifically in nuclear fusion, space physics, and nonlinear plasma theory. At the same time, the energy shortage on the one hand and the exploration of Jupiter and Saturn on the other have increased the national awareness of the important applications of plasma physics to energy production and to the understanding of our space environment. In magnetic confinement fusion, this period has seen the attainment 13 of a Lawson number nTE of 2 x 10 cm -3 sec in the Alcator tokamaks at MIT; neutral-beam heating of the PL T tokamak at Princeton to KTi = 6. 5 keV; increase of average ß to 3%-5% in tokamaks at Oak Ridge and General Atomic; and the stabilization of mirror-confined plasmas at Livermore, together with injection of ion current to near field-reversal conditions in the 2XIIß device. Invention of the tandem mirror has given magnetic confinement a new and exciting dimension. New ideas have emerged, such as the compact torus, surface-field devices, and the EßT mirror-torus hybrid, and some old ideas, such as the stellarator and the reversed-field pinch, have been revived. Radiofrequency heat ing has become a new star with its promise of dc current drive. Perhaps most importantly, great progress has been made in the understanding of the MHD behavior of toroidal plasmas: tearing modes, magnetic Vll Vlll islands, and disruptions.

Plasma Engineering
Plasma Engineering

Author: Michael Keidar

Publisher: Academic Press

Published: 2018-08-06

Total Pages: 587

ISBN-13: 0128137037

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Plasma Engineering, Second Edition, applies the unique properties of plasmas (ionized gases) to improve processes and performance over many fields, such as materials processing, spacecraft propulsion and nanofabrication. The book considers this rapidly expanding discipline from a unified standpoint, addressing fundamentals of physics and modeling, as well as new and real-word applications in aerospace, nanotechnology and bioengineering. This updated edition covers the fundamentals of plasma physics at a level suitable for students using application examples and contains the widest variety of applications of any text on the market, spanning the areas of aerospace engineering, nanotechnology and nanobioengineering. This is highly useful for courses on plasma engineering or plasma physics in departments of Aerospace Engineering, Electrical Engineering and Physics. It is also useful as an introduction to plasma engineering and its applications for early career researchers and practicing engineers. - Features new material relevant to application, including emerging areas of plasma nanotechnology and medicine - Contains a new chapter on plasma-based control, as well as a description of RF and microwave-based plasma applications, plasma lighting, reforming and other most recent application areas - Provides a technical treatment of the fundamental and engineering principles used in plasma applications

Plasma Confinement
Plasma Confinement

Author: R. D. Hazeltine

Publisher: Courier Corporation

Published: 2013-02-20

Total Pages: 484

ISBN-13: 0486151034

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Graduate-level text examines the essential physics underlying international research in magnetic confinement fusion with accounts of fundamental concepts behind methods of confining plasma at or near thermonuclear conditions. 1992 edition.