Handbook of Digital Imaging

Handbook of Digital Imaging

Author: Michael Kriss

Publisher: John Wiley & Sons

Published: 2015-02-16

Total Pages: 1936

ISBN-13: 0470510595

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A comprehensive and practical analysis and overview of the imaging chain through acquisition, processing and display The Handbook of Digital Imaging provides a coherent overview of the imaging science amalgam, focusing on the capture, storage and display of images. The volumes are arranged thematically to provide a seamless analysis of the imaging chain from source (image acquisition) to destination (image print/display). The coverage is planned to have a very practical orientation to provide a comprehensive source of information for practicing engineers designing and developing modern digital imaging systems. The content will be drawn from all aspects of digital imaging including optics, sensors, quality, control, colour encoding and decoding, compression, projection and display. Contains approximately 50 highly illustrated articles printed in full colour throughout Over 50 Contributors from Europe, US and Asia from academia and industry The 3 volumes are organized thematically for enhanced usability: Volume 1: Image Capture and Storage; Volume 2: Image Display and Reproduction, Hardcopy Technology, Halftoning and Physical Evaluation, Models for Halftone Reproduction; Volume 3: Imaging System Applications, Media Imaging, Remote Imaging, Medical and Forensic Imaging 3 Volumes www.handbookofdigitalimaging.com


Vacuum Nanoelectronic Devices

Vacuum Nanoelectronic Devices

Author: Anatoliy Evtukh

Publisher: John Wiley & Sons

Published: 2015-07-14

Total Pages: 469

ISBN-13: 1119037972

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Introducing up-to-date coverage of research in electron field emission from nanostructures, Vacuum Nanoelectronic Devices outlines the physics of quantum nanostructures, basic principles of electron field emission, and vacuum nanoelectronic devices operation, and offers as insight state-of-the-art and future researches and developments. This book also evaluates the results of research and development of novel quantum electron sources that will determine the future development of vacuum nanoelectronics. Further to this, the influence of quantum mechanical effects on high frequency vacuum nanoelectronic devices is also assessed. Key features: • In-depth description and analysis of the fundamentals of Quantum Electron effects in novel electron sources. • Comprehensive and up-to-date summary of the physics and technologies for THz sources for students of physical and engineering specialties and electronics engineers. • Unique coverage of quantum physical results for electron-field emission and novel electron sources with quantum effects, relevant for many applications such as electron microscopy, electron lithography, imaging and communication systems and signal processing. • New approaches for realization of electron sources with required and optimal parameters in electronic devices such as vacuum micro and nanoelectronics. This is an essential reference for researchers working in terahertz technology wanting to expand their knowledge of electron beam generation in vacuum and electron source quantum concepts. It is also valuable to advanced students in electronics engineering and physics who want to deepen their understanding of this topic. Ultimately, the progress of the quantum nanostructure theory and technology will promote the progress and development of electron sources as main part of vacuum macro-, micro- and nanoelectronics.


Oxide Electronics

Oxide Electronics

Author: Asim K. Ray

Publisher: John Wiley & Sons

Published: 2021-04-12

Total Pages: 628

ISBN-13: 1119529476

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Oxide Electronics Multiple disciplines converge in this insightful exploration of complex metal oxides and their functions and properties Oxide Electronics delivers a broad and comprehensive exploration of complex metal oxides designed to meet the multidisciplinary needs of electrical and electronic engineers, physicists, and material scientists. The distinguished author eschews complex mathematics whenever possible and focuses on the physical and functional properties of metal oxides in each chapter. Each of the sixteen chapters featured within the book begins with an abstract and an introduction to the topic, clear explanations are presented with graphical illustrations and relevant equations throughout the book. Numerous supporting references are included, and each chapter is self-contained, making them perfect for use both as a reference and as study material. Readers will learn how and why the field of oxide electronics is a key area of research and exploitation in materials science, electrical engineering, and semiconductor physics. The book encompasses every application area where the functional and electronic properties of various genres of oxides are exploited. Readers will also learn from topics like: Thorough discussions of High-k gate oxide for silicon heterostructure MOSFET devices and semiconductor-dielectric interfaces An exploration of printable high-mobility transparent amorphous oxide semiconductors Treatments of graphene oxide electronics, magnetic oxides, ferroelectric oxides, and materials for spin electronics Examinations of the calcium aluminate binary compound, perovoksites for photovoltaics, and oxide 2Degs Analyses of various applications for oxide electronics, including data storage, microprocessors, biomedical devices, LCDs, photovoltaic cells, TFTs, and sensors Suitable for researchers in semiconductor technology or working in materials science, electrical engineering, and physics, Oxide Electronics will also earn a place in the libraries of private industry researchers like device engineers working on electronic applications of oxide electronics. Engineers working on photovoltaics, sensors, or consumer electronics will also benefit from this book.


Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors

Author: Cheol Seong Hwang

Publisher: Springer Science & Business Media

Published: 2013-10-18

Total Pages: 266

ISBN-13: 146148054X

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.


The Global Technology Revolution 2020, In-Depth Analyses: Bio/Nano/Materials/Information Trends, Drivers, Barriers, and Social Implications

The Global Technology Revolution 2020, In-Depth Analyses: Bio/Nano/Materials/Information Trends, Drivers, Barriers, and Social Implications

Author: Richard Silberglitt

Publisher: Rand Corporation

Published: 2002-08-30

Total Pages: 332

ISBN-13: 0833041142

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In 2020, areas of particular importance for technology trends will include biotechnology, nanotechnology, materials technology, and information technology. This report, the companion document to The Global Technology Revolution 2020, Executive Summary (Silberglitt et al., MG-475-NIC, 2006), assesses in detail a sample of 29 countries with respect to their ability to acquire and implement 16 key technology applications.


Advanced Nano Deposition Methods

Advanced Nano Deposition Methods

Author: Yuan Lin

Publisher: John Wiley & Sons

Published: 2016-08-29

Total Pages: 328

ISBN-13: 3527696458

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This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.


Ellipsometry at the Nanoscale

Ellipsometry at the Nanoscale

Author: Maria Losurdo

Publisher: Springer Science & Business Media

Published: 2013-03-12

Total Pages: 740

ISBN-13: 3642339565

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This book presents and introduces ellipsometry in nanoscience and nanotechnology making a bridge between the classical and nanoscale optical behaviour of materials. It delineates the role of the non-destructive and non-invasive optical diagnostics of ellipsometry in improving science and technology of nanomaterials and related processes by illustrating its exploitation, ranging from fundamental studies of the physics and chemistry of nanostructures to the ultimate goal of turnkey manufacturing control. This book is written for a broad readership: materials scientists, researchers, engineers, as well as students and nanotechnology operators who want to deepen their knowledge about both basics and applications of ellipsometry to nanoscale phenomena. It starts as a general introduction for people curious to enter the fields of ellipsometry and polarimetry applied to nanomaterials and progresses to articles by experts on specific fields that span from plasmonics, optics, to semiconductors and flexible electronics. The core belief reflected in this book is that ellipsometry applied at the nanoscale offers new ways of addressing many current needs. The book also explores forward-looking potential applications.