PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

Author:

Publisher: Elsevier

Published: 1998-10-29

Total Pages: 434

ISBN-13: 0080542921

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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Silicon Devices
Silicon Devices

Author: Kenneth A. Jackson

Publisher: John Wiley & Sons

Published: 2008-11-21

Total Pages: 210

ISBN-13: 3527611797

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Silicon is the most important material for the electronics industry. In modern microelectronics silicon devices like diodes and transistors play a major role, and devices like photodetectors or solar cells gain ever more importance. This concise handbook deals with one of the most important topics for the electronics industry. World renowned authors have contributed to this unique overview of the processing of silicon and silicon devices.

Materials Science and Technology, Processing of Semiconductors
Materials Science and Technology, Processing of Semiconductors

Author: Kenneth A. Jackson

Publisher: Wiley-VCH

Published: 1996-09-17

Total Pages: 716

ISBN-13:

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This self-contained handbook deals with the enabling materials technology for the electronics industry. World renowned authors have contributed to this unique treatment of the processing of semiconductors and related technologies. Contents: Wilkes: Silicon Processing. Mullin: Compound Semiconductor Processing, Kuech/BleLagally/Tischler: Epitaxial Growth. Leuschner/Pawlowski: Photolithography. Griffin: Doping. Turner/Donohoe: Etching Processes in Semiconductor Manufacturing. Chang/Sze: Silicon Device Structures. Lam/Stanchina: Compound Semiconductor Device Structures. Kwong: Silicon Device Processing. Parsey, Jr: Compound Semiconductor Device Processing. Amey: Chip Carriers. Knausenberger/Turlik: Interconnection Systems.

Advances in Imaging and Electron Physics
Advances in Imaging and Electron Physics

Author: Peter W. Hawkes

Publisher: Elsevier

Published: 2011-07-29

Total Pages: 263

ISBN-13: 0080465358

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Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.