Laser and Electron Beam Processing of Materials
Laser and Electron Beam Processing of Materials

Author: C.W. White

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 788

ISBN-13: 0323142532

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Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.

Laser Materials Processing
Laser Materials Processing

Author: Michael Bass

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 491

ISBN-13: 0444601325

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Laser Materials Processing aims to introduce lasers and laser systems to the newcomers to laser terminology and to provide enough background material on lasers to reduce one's hesitation to employ these devices. The book covers the use of lasers in materials processing, including its application in cutting and welding, as well as the principles behind them; laser heat treatment; rapid solidification laser processing at high power density; shaping of materials using lasers; and laser processing of semiconductors. The selection also covers considerations in laser manufacturing and a survey in laser applications. The text is recommended for both experienced laser users, engineers, or scientists yet unfamiliar with the subject. The book is also recommended for those who wish to know about the importance of lasers in the field of materials processing, as the bulk of the book is devoted to the discussions of some of the most important materials processing activities in use or under development.

Materials and Process Characterization
Materials and Process Characterization

Author: Norman G. Einspruch

Publisher: Academic Press

Published: 2014-12-01

Total Pages: 614

ISBN-13: 1483217736

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VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.

Laser Science and Technology
Laser Science and Technology

Author: A.N. Chester

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 449

ISBN-13: 1475703783

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The conference "Laser Science and Technology" was held May 11-19, 1987 in Erice, Sicily. This was the 12th conference organized by the Internatio nal School of Quantum Electronics, under the auspices of the "Ettore Majorana" Center for Scientific Culture. This volume contains both the in vited and contributed papers presented at the conference, covering current research work in two areas: new laser sources, and laser applications. The operation of the first laser by Dr. Theodore Maiman in 1960 initia ted a decade of scientific exploration of new laser sources. This was fol lowed by the decade of the 1970s, which was characterized by "technology push" in which the discoveries of the 1960s were seeking practical applica tion. In the 1980s we are instead seeking "applications pull," in which the success and rapid maturing of laser applications provides both inspiration and financial resources to stimulate additional work both on laser sources and applications. The papers presented in these Proceedings attest to the great vitali ty of research in both these areas: New Laser Sources. The papers describe current developments in ultra violet excimer lasers, X-ray lasers, and free electron lasers. These new lasers share several characteristics: each is a potentially important coher ent source; each is at a relatively short wavelength (below 1 micrometer); and each is receiving significant development attention today.

Chemical Processing with Lasers
Chemical Processing with Lasers

Author: Dieter Bäuerle

Publisher: Springer Science & Business Media

Published: 2013-03-09

Total Pages: 253

ISBN-13: 3662025051

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Materials processing with lasers is a rapidly expanding field which is increasingly captivating the attention of scientists, engineers and manufacturers alike. The aspect of most interest to scientists is provided by the basic interaction mechanisms between the intense light of a laser and materials exposed to a chemically reactive or nonreactive surrounding medium. Engineers and manufacturers see in the laser a new tool which will not only make manufacturing cheaper, faster, cleaner and more accurate but which also opens up entirely new technologies and manufacturing methods that are simply not available using existing techniques. Actual and potential applications range from laser machining to laser-induced materials transformation, coating, patterning, etc. , opening up the prospect of exciting new processing methods for micromechanics, metallurgy, integrated optics, semiconductor manufacture and chemical engineering. This book concentrates on the new and interdisciplinary field of 1 aser-i nduced chemicaZ process i ng of materi als. The techni que permits maskless single-step deposition of thin films of metals, semiconductors or insulators with lateral dimensions ranging from a few tenths of a micrometer up to several centimeters. Moreover, materials removal or synthesis, or surface modifications, such as oxidation, nitridation, reduction, metallization and doping, are also possible within similar dimensions. This book is meant as an introduction. It attempts to cater for the very broad range of specific interests which different groups of readers will have, and this thinking underlies the way in which the material has been arranged.

Laser Annealing of Semiconductors
Laser Annealing of Semiconductors

Author: J Poate

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 577

ISBN-13: 0323145426

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Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.

Large Scale Integrated Circuits Technology: State of the Art and Prospects
Large Scale Integrated Circuits Technology: State of the Art and Prospects

Author: Leo Esaki

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 745

ISBN-13: 9400976453

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A NATO Advanced Study Institute on "Large Scale Integrated Circuits Technology: State of the Art and Prospects" was held at Ettore Majorana Centre for Scientific Culture, Erice (Italy) on July 15-27, 1981, the first course of the International School of Solid-State Device Research. This volume contains the School Proceedings: fundamentals as well as up-to-date information on each subject presented by qualified authors. The material covered in this volume has been arranged in self-consistent chapters. Therefore, the Proceedings may be used as a suitable textbook or authoritative review for research workers and advanced students in the relevant field. The nascent information society is based on advanced technologies which will revolutionize human abilities to manipulate and communicate information. One of the most important underpinnings for developing such an information society lies in innovations in semiconductor microelectronics. Such innova tions, indeed, are dramatically reducing the cost of transmitting, storing, and processing information with improved performance, ushering in an era charac terized by large scale integration -the subject of this book.