Flat Panel Display Materials III: Volume 471
Flat Panel Display Materials III: Volume 471

Author: Ron Fulks

Publisher:

Published: 1997-09-10

Total Pages: 360

ISBN-13:

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Flat-panel displays are rapidly becoming the displays of choice for a variety of information-displaying applications ranging from laptop computers to automobile and cockpit read-out devices. Passive matrix liquid-crystal displays, and more recently, active matrix liquid-crystal displays (AMLCDs) have led the way in the display revolution. In addition, emissive displays based on field emission, electroluminescence, and plasma charge are attracting considerable interest. Ultimately, however, the advancement in flat-panel display applications will be driven by cost and performance advantages which are dependent on the advancement of materials and process technologies used to fabricate the displays. This book focuses on the materials and large-area processes used by the various display technologies, both emissive and nonemissive, including liquid-crystal, electroluminescent, plasma, field-emission, and micromechanical displays. Topics include: AMLCD materials and processes; thin-film transistors for AMLCDs; emissive displays and materials and phosphor materials.

Epitaxial Oxide Thin Films III: Volume 474
Epitaxial Oxide Thin Films III: Volume 474

Author: Chang-Beom Eom

Publisher: Materials Research Society

Published: 1997-09-10

Total Pages: 0

ISBN-13: 9781558993785

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As a result of the progress towards, and potential realized in electronic and optical device applications, the interest in epitaxial oxide thin films continue to flourish. The understanding of epitaxial oxide heterostructures has progressed, including magnetic, magnetoresistive, dielectric, ferroelectric and superconducting oxide materials. This book focuses on the fundamental issues of oxide epitaxy, microstructural evolution in epitaxy, and physical properties of epitaxial oxide thin films and how these issues relate to device applications. The book provides a vehicle through which groups of scientists working on a set of diverse phenomena could interact and present findings on very common specific themes involving similar materials. Due to the explosive growth of work in the area of colossal magnetoresistive (CMR) materials, especially in epitaxial form, the book also offers a forum to critically examine the fundamental nature of CMR in epitaxial oxide thin films and the relationship between CMR and defect structure. Other areas of emphasis include: ferroelectric memories, nonlinear optical waveguides, microwave electronics and magnetic oxide thin films.

Thin-Film Structures for Photovoltaics: Volume 485
Thin-Film Structures for Photovoltaics: Volume 485

Author: Eric D. Jones

Publisher: Mrs Proceedings

Published: 1998

Total Pages: 336

ISBN-13:

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Contains 49 papers from the December 1997 symposium. The contributions are organized into three sections devoted to silicon-, II-VI-, and III-V-based thin films, as well as a section on general thin films. A number of processes are dealt with, including VEST; ion-beam, plasma, laser, low temperature sputter, and metalorganic chemical vapor depositions; and various growth techniques. In addition, analysis and modeling methodologies are discussed. Annotation copyrighted by Book News, Inc., Portland, OR

Materials Science of the Cell: Volume 489
Materials Science of the Cell: Volume 489

Author: B. Mulder

Publisher:

Published: 1998-11-16

Total Pages: 248

ISBN-13:

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The 34 papers investigate the processing routes and properties of the complex molecular and macromolecular structures that hold biological cells together, both to reveal some of the mysteries of cell function and to identify natural solutions for optimizing membranes that might be adapted for applications in materials science. They cover the mechanics of DNA; the cytoskeleton, semiflexible polymers, polyelectrolytes, and motor proteins; properties and models of membranes and their interactions with macromolecules; biomaterials; and cells and cellular processes. Annotation copyrighted by Book News, Inc., Portland, OR

Materials for Optical Limiting II: Volume 479
Materials for Optical Limiting II: Volume 479

Author: Richard Lee Sutherland

Publisher:

Published: 1997-12-30

Total Pages: 358

ISBN-13:

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The proliferation of lasers and systems employing lasers has brought with it the potential for adverse effects from these bright, coherent light sources. This includes the possibility of damage from pulsed lasers, as well as temporary blinding by continuous-waver lasers. With nearly every wavelength possible being emitted by these sources, there exists a need to develop optical limiters and tunable filters which can suppress undesired radiation of any wavelength. This book addresses a number of materials and devices which have the potential for meeting the challenge. The proceedings is divided into five parts. Parts I and II cover research in organic and inorganic materials primarily based on nonlinear absorption or phase transitions for optical limiting of pulsed lasers. Part III includes photo-refractive materials and liquid crystals which find primary applications in dynamic filters. Part IV covers various aspects of device and material characterization, including nonlinear beam propagation effects. Theoretical modelling of materials properties is the subject of Part V.