Electron-Beam Technology in Microelectronic Fabrication
Electron-Beam Technology in Microelectronic Fabrication

Author: George Brewer

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 377

ISBN-13: 0323153410

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Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.

Nanofabrication
Nanofabrication

Author: Maria Stepanova

Publisher: Springer Science & Business Media

Published: 2011-11-08

Total Pages: 344

ISBN-13: 3709104246

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Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Introduction to Microelectronic Fabrication
Introduction to Microelectronic Fabrication

Author: Richard C. Jaeger

Publisher: Pearson

Published: 2002

Total Pages: 0

ISBN-13: 9780201444940

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For courses in Theory and Fabrication of Integrated Circuits. The author's goal in writing this text was to present a concise survey of the most up-to-date techniques in the field. It is devoted exclusively to processing, and is highlighted by careful explanations, clear, simple language, and numerous fully-solved example problems. This work assumes a minimal knowledge of integrated circuits and of terminal behavior of electronic components such as resistors, diodes, and MOS and bipolar transistors.

Handbook of VLSI Microlithography
Handbook of VLSI Microlithography

Author: John N. Helbert

Publisher: William Andrew

Published: 2001-04-01

Total Pages: 1025

ISBN-13: 0815517807

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This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Nanofabrication Using Focused Ion and Electron Beams
Nanofabrication Using Focused Ion and Electron Beams

Author: Ivo Utke

Publisher: Oxford University Press

Published: 2012-03-05

Total Pages: 830

ISBN-13: 0199920990

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Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.

Examining the Submicron World
Examining the Submicron World

Author: Ralph Feder

Publisher: Springer Science & Business Media

Published: 2013-11-21

Total Pages: 381

ISBN-13: 146132209X

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An Institute like ours cannot help but lend credence to the notion of the late Derek J. de Solla Price of Yale University that "the scientific revolution was largely the improvement, invention and use of a series of instruments . . . . that expanded the reach of science in innumerable directions". Most of science today and in years gone by depends on the experimental observation of struc ture on the small scale with microscopes, and on the large scale with telescopes. The first instruments to expand the observational range of the human eye were simple optical systems, designed in the case of microscopes and telescopes to magnify the image. The big breakthrough in the 17th century was not when Galileo first turned his telescope to the heavens, but when improvements in lens-grinding techniques allowed eyeglass makers to make the first telescope. Early microscopy revealed new and previously unsuspected microstruc tures in biological and non-biological materials and thus helped to enlarge on the understanding of the relationship between structure and properties. The natural inclination of all microscopists, the desire to observe ever smaller structures, was satisfied by the construction of higher quality optical systems which reduced the aberrations limiting the usable magnification. The modem optical microscope is the result of this evolution in design and construction, and it can be operated easily to achieve close to the theoretical resolution.

Materials For Photonic Devices
Materials For Photonic Devices

Author: A D'andrea

Publisher: World Scientific

Published: 1991-11-15

Total Pages: 470

ISBN-13: 9814556254

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The post-industrial societies' demand for more information processing and communication is a challenge to modern technology.This workshop is the first forum in Italy fully devoted to the advanced materials for opto-electronic and photonic device applications.The volume contains selected papers presented at the workshop and provide an updated overview by leading Italian public and private research groups on the state-of-the-art developments in crystal growth, tailoring and characterization of a large class of materials, namely semiconductors, glasses, polymers and organic molecules.Internationally recognized scientists on materials science have contributed to the workshop and their contributions have been reported in this volume.

Ion Implantation and Beam Processing
Ion Implantation and Beam Processing

Author: J. S. Williams

Publisher: Academic Press

Published: 2014-06-28

Total Pages: 432

ISBN-13: 1483220648

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Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.

Polymers for Electronic & Photonic Application
Polymers for Electronic & Photonic Application

Author: C. P. Wong

Publisher: Elsevier

Published: 2013-10-22

Total Pages: 676

ISBN-13: 1483289397

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The most recent advances in the use of polymeric materials by the electronic industry can be found in Polymers for Electronic and Photonic Applications. This bookprovides in-depth coverage of photoresis for micro-lithography, microelectronic encapsulants and packaging, insulators, dielectrics for multichip packaging,electronic and photonic applications of polymeric materials, among many other topics. Intended for engineers and scientists who design, process, and manufacturemicroelectronic components, this book will also prove useful for hybrid and systems packaging managers who want to be informed of the very latest developments inthis field.* Presents most recent advances in the use of polymeric materials by the electronic industry* Contributions by foremost experts in the field