Time Domain Methods in Electrodynamics
Time Domain Methods in Electrodynamics

Author: Peter Russer

Publisher: Springer Science & Business Media

Published: 2008-09-26

Total Pages: 423

ISBN-13: 3540687688

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This book consists of contributions given in honor of Wolfgang J.R. Hoefer. Space and time discretizing time domain methods for electromagnetic full-wave simulation have emerged as key numerical methods in computational electromagnetics. Time domain methods are versatile and can be applied to the solution of a wide range of electromagnetic field problems. Computing the response of an electromagnetic structure to an impulsive excitation localized in space and time provides a comprehensive characterization of the electromagnetic properties of the structure in a wide frequency range. The most important methods are the Finite Difference Time Domain (FDTD) and the Transmission Line Matrix (TLM) methods. The contributions represent the state of the art in dealing with time domain methods in modern engineering electrodynamics for electromagnetic modeling in general, the Transmission Line Matrix (TLM) method, the application of network concepts to electromagnetic field modeling, circuit and system applications and, finally, with broadband devices, systems and measurement techniques.

Electromagnetics and Network Theory and their Microwave Technology Applications
Electromagnetics and Network Theory and their Microwave Technology Applications

Author: Stefan Lindenmeier

Publisher: Springer Science & Business Media

Published: 2011-07-13

Total Pages: 378

ISBN-13: 3642183751

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This volume provides a discussion of the challenges and perspectives of electromagnetics and network theory and their microwave applications in all aspects. It collects the most interesting contribution of the symposium dedicated to Professor Peter Russer held in October 2009 in Munich.

MMIC Design
MMIC Design

Author: Ian D. Robertson

Publisher:

Published: 1995

Total Pages: 536

ISBN-13:

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This book draws together all the important MMIC design methods and circuit topologies into one volume. It is essential reading as both a tutorial guide for those new to MMIC design and as a circuit design handbook for experienced designers. The contributors are acknowledged experts from industry and academia. The first four chapters describe the active and passive components, processing technology and CAD techniques. The design of the circuits is then covered in individual chapters treating amplifiers, mixers, phase shifters, switches and attenuators, and oscillators. The final three chapters describe silicon millimetre-wave circuits, measurement techniques and advanced circuit concepts.

The Physics of Ultra-High-Density Magnetic Recording
The Physics of Ultra-High-Density Magnetic Recording

Author: M.L. Plumer

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 364

ISBN-13: 364256657X

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Application-oriented book on magnetic recording, focussing on the underlying physical mechanisms that play crucial roles in medium and transducer development for high areal density disk drives.

Broadband Dielectric Spectroscopy
Broadband Dielectric Spectroscopy

Author: Friedrich Kremer

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 740

ISBN-13: 3642561209

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Both an introductory course to broadband dielectric spectroscopy and a monograph describing recent dielectric contributions to current topics, this book is the first to cover the topic and has been hotly awaited by the scientific community.

High Dielectric Constant Materials
High Dielectric Constant Materials

Author: Howard Huff

Publisher: Springer Science & Business Media

Published: 2005

Total Pages: 740

ISBN-13: 9783540210818

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Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.