Energy Beam-solid Interactions and Transient Thermal Processing, 1985, IV
Author: Van Tran Nguyen
Publisher:
Published: 1985
Total Pages: 586
ISBN-13:
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Author: Van Tran Nguyen
Publisher:
Published: 1985
Total Pages: 586
ISBN-13:
DOWNLOAD EBOOKAuthor: I.W. Boyd
Publisher: Elsevier
Published: 1990-02-01
Total Pages: 482
ISBN-13: 0444596658
DOWNLOAD EBOOKThis volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.
Author: Dawon Kahng
Publisher: Academic Press
Published: 2013-10-22
Total Pages: 371
ISBN-13: 1483214788
DOWNLOAD EBOOKSilicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid isothermal annealing; adiabatic annealing with laser and electron beams; pulsed melting; thermal flux annealing; rapid isothermal annealing; and several applications stemming from rapid annealing and semiconductor processing with directed-energy beams. The second chapter is concerned with the use of electron cyclotron resonance plasmas in two important materials processing techniques: reactive ion-beam etching and plasma deposition. The last chapter of the book deals with the exploding area of very large scale integration processing and process simulation. Physicists, chemists, and engineers involved in silicon integrated circuits will find the book invaluable.
Author: E.F. Krimmel
Publisher: Elsevier
Published: 1989-02-01
Total Pages: 744
ISBN-13: 0444596364
DOWNLOAD EBOOKThis symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: S.E. Donnelly
Publisher: Springer
Published: 2013-12-20
Total Pages: 458
ISBN-13: 1489936807
DOWNLOAD EBOOKThe NATO Advanced Research Workshop on Fundamental Aspects of Inert Gases in Solids, held at Bonas, France from 16-22 September 1990, was the fifth in a series of meetings that have been held in this topic area since 1979. The Consultants' Meeting in that year at Harwell on Rare Gas Behaviour in Metals and Ionic Solids was followed in 1982 by the Jiilich Inter national Symposium on Fundamental Aspects of Helium in Metals. Two smaller meetings have followed-a CECAM organised workshop on Helium Bubbles in Metals was held at Orsay, France in 1986 while in February 1989, a Topical Symposium on Noble Gases in Metals was held in Las Vegas as part of the large TMS/AIME Spring Meeting. As is well known, the dominating feature of inert gas atoms in most solids is their high heat of solution, leading in most situations to an essentially zero solubility and gas-atom precipita tion. In organising the workshop, one particular aim was to target the researchers in the field of inert-gas/solid interactions from three different areas--namely metals, tritides and nuclear fuels-in order to encourage and foster the cross-fertilisation of approaches and ideas. In these three material classes, the behaviour of inert gases in metals has probably been most studied, partly from technological considerations-the effects of helium production via (n, a) reac tions during neutron irradiation are of importance, particularly in a fusion reactor environ ment-and partly from a more fundamental viewpoint.
Author: E.I. Givargizov
Publisher: Springer Science & Business Media
Published: 2012-12-06
Total Pages: 213
ISBN-13: 146153660X
DOWNLOAD EBOOKThis volume, as the previous ones, consists primarily of review artic1es. However, it also contains a large quantity of original material on the growth of crystals and films. Priority is given to experimental work. Only two artic1es are concerned exc1usively with the theory of crystal growth. Theoretical aspects are treated in several others. This volume is divided into three parts. Part I, "Epitaxy and Transformations in Thin Films," stems from the current broad application of lasers and optical effects in general to crystal growth (in particular, the growth of thin films). The first three artic1es of the book are devoted to this topic. In particular, the laser pulse vaporization method, for which a comparatively slow deposition rate is typical (which should not always be viewed as a drawback), is distinguished by the unique kinetics of the initial growth stages. These are not entirely explained. However, this method is completely suitable for oriented or generally ordered growth of films under otherwise equal conditions. Another artic1e of this section is based on use of ultrashort (down to picosecond) laser pulses. It emphasizes the nonequilibrium processes of crystallization and decrystallization that are characteristic for such influences. In particular, material heated above its melting point and metastable states in the semiconductor melt exhibit these qualities.
Author: Maurice H. Francombe
Publisher: Elsevier
Published: 2013-10-22
Total Pages: 262
ISBN-13: 1483103307
DOWNLOAD EBOOKPhysics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.
Author: Harold Earl Bennett
Publisher:
Published: 1988
Total Pages: 726
ISBN-13:
DOWNLOAD EBOOKAuthor: David J. Srolovitz
Publisher: Springer Science & Business Media
Published: 2012-12-06
Total Pages: 454
ISBN-13: 1468457039
DOWNLOAD EBOOKThis book contains proceedings of an international symposium on Atomistic th Simulation of Materials: Beyond Pair Potentials which was held in Chicago from the 25 th to 30 of September 1988, in conjunction with the ASM World Materials Congress. This symposium was financially supported by the Energy Conversion and Utilization Technology Program of the U. S Department of Energy and by the Air Force Office of Scientific Research. A total of fifty four talks were presented of which twenty one were invited. Atomistic simulations are now common in materials research. Such simulations are currently used to determine the structural and thermodynamic properties of crystalline solids, glasses and liquids. They are of particular importance in studies of crystal defects, interfaces and surfaces since their structures and behavior playa dominant role in most materials properties. The utility of atomistic simulations lies in their ability to provide information on those length scales where continuum theory breaks down and instead complex many body problems have to be solved to understand atomic level structures and processes.
Author:
Publisher:
Published: 1969
Total Pages: 1090
ISBN-13:
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