Written by a pioneer in the field, this overview of charged particle optics provides a solid introduction to the subject area for all physicists wishing to design their own apparatus or better understand the instruments with which they work. It begins by introducing electrostatic lenses and fields used for acceleration, focusing and deflection of ions or electrons. Subsequent chapters give detailed descriptions of electrostatic deflection elements, uniform and non-uniform magnetic sector fields, image aberrations, and, finally, fringe field confinement.
Optics of Charged Particles, 2nd edition, describes how charged particles move in the fields of magnetic and electrostatic dipoles, quadrupoles, higher order multipoles, and field-free regions. Since the first edition, published over 30 years ago, new technologies have emerged and have been used for new ion optical instruments like, for instance, time-of-flight mass analyzers, which are described now. Fully updated and revised, this new edition provides ways to design mass separators, spectrographs, and spectrometers, which are the key tools in organic chemistry and for drug developments, in environmental trace analyses and for investigations in nuclear physics like the search for super heavy elements as well as molecules in space science. The book discusses individual particle trajectories as well as particle beams in space and in phase-space, and it provides guidelines for the design of particle optical instruments. For experienced researchers, working in the field, it highlights the latest developments in new ion optical instruments and provides guidelines and examples for the design of new instruments for the transport of beams of charged particles and the mass/charge or energy/charge analyses of ions. Furthermore, it provides background knowledge required to accurately understand and analyze results, when developing ion-optical instruments. By providing a comprehensive overview of the field of charged particle optics, this edition of the book supports all those working, directly or indirectly, with charged-particle research or the development of ion- and electron-analyzing instruments. Provides enhanced, clear descriptions, and derivations making complex aspects of the general motion of charged particles understandable as well as features of charged particle analyzing instruments Assists the reader in applying insights obtained from the principles of charged particle optics to the design of new transporting and mass- or energy-analyzing instruments for ions Discusses new applications and newly occurring issues, which have arisen since the first edition
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
Although particle accelerators are the book's main thrust, it offers a broad synoptic description of beams which applies to a wide range of other devices such as low-energy focusing and transport systems and high-power microwave sources. Develops material from first principles, basic equations and theorems in a systematic way. Assumptions and approximations are clearly indicated. Discusses underlying physics and validity of theoretical relationships, design formulas and scaling laws. Features a significant amount of recent work including image effects and the Boltzmann line charge density profiles in bunched beams.
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.
Classical Charged Particle Beam Optics used in the design and operation of all present-day charged particle beam devices, from low energy electron microscopes to high energy particle accelerators, is entirely based on classical mechanics. A question of curiosity is: How is classical charged particle beam optics so successful in practice though the particles of the beam, like electrons, are quantum mechanical? Quantum Mechanics of Charged Particle Beam Optics answers this question with a comprehensive formulation of ‘Quantum Charged Particle Beam Optics’ applicable to any charged particle beam device.
