Thin Film Device Applications
Thin Film Device Applications

Author: Kasturi Chopra

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 305

ISBN-13: 1461336821

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Two-dimensional materials created ab initio by the process of condensation of atoms, molecules, or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, nonequilibrium microstructure, and metallurgy. Further, these characteristic features of thin films can be drasti cally modified and tailored to obtain the desired and required physical characteristics. These features form the basis of development of a host of extraordinary active and passive thin film device applications in the last two decades. On the one extreme, these applications are in the submicron dimensions in such areas as very large scale integration (VLSI), Josephson junction quantum interference devices, magnetic bubbles, and integrated optics. On the other extreme, large-area thin films are being used as selective coatings for solar thermal conversion, solar cells for photovoltaic conver sion, and protection and passivating layers. Indeed, one would be hard pressed to find many sophisticated modern optical and electronic devices which do not use thin films in one way or the other. With the impetus provided by industrial applications, the science and technology of thin films have undergone revolutionary development and even today continue to be recognized globally as frontier areas of RID work. Major technical developments in any field of science and technology are invariably accompanied by an explosion of published literature in the form of scientific publications, reviews, and books.

Polycrystalline And Amorphous Thin Films And Devices
Polycrystalline And Amorphous Thin Films And Devices

Author: Lawrence Kazmerski

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 321

ISBN-13: 0323156045

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Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.

An Introduction to Physics and Technology of Thin Films
An Introduction to Physics and Technology of Thin Films

Author: Alfred Wagendristel

Publisher: World Scientific

Published: 1994

Total Pages: 170

ISBN-13: 9789810216160

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Based on lecture notes that have been used successfully by the authors for the past 10 years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin film physics and technology. It is concise, comprehensive and well organized. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, 3 special topics ? ferromagnetic films, diffusion in thin films and mechanical properties of thin films ? are discussed.Given its wide scope, this book is relevant not just to those involved in materials science but also to engineers as well.

A Review of Ceramic Thin Film Technology
A Review of Ceramic Thin Film Technology

Author: Milo Macha

Publisher:

Published: 1967

Total Pages: 90

ISBN-13:

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The report comprises a detailed description of the materials, techniques and problems in each of the three major areas of thin film applications--dielectrics, magnetics and semiconductors. Included in the report are also basic theories necessary for a complete understanding of the physical and chemical processes related to the areas of interest. Theoretical analysis leads to a description of the critical physical, chemical and structural requirements of films for device applications. The state of the art of all aspects of ceramic thin film technology is critically reviewed, and recommendations are suggested to overcome existing limitations.

Physics of Thin Films
Physics of Thin Films

Author: Maurice H. Francombe

Publisher: Elsevier

Published: 2013-10-22

Total Pages: 262

ISBN-13: 1483103307

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Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.

Thin Film Solar Cells
Thin Film Solar Cells

Author: K. L. Chopra

Publisher: Springer Science & Business Media

Published: 2013-11-11

Total Pages: 615

ISBN-13: 1489904182

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"You, 0 Sun, are the eye of the world You are the soul of all embodied beings You are the source of all creatures You are the discipline of all engaged in work" - Translated from Mahabharata 3rd Century BC Today, energy is the lifeline and status symbol of "civilized" societies. All nations have therefore embarked upon Research and Development pro grams of varying magnitudes to explore and effectively utilize renewable sources of energy. Albeit a low-grade energy with large temporal and spatial variations, solar energy is abundant, cheap, clean, and renewable, and thus presents a very attractive alternative source. The direct conver sion of solar energy to electricity (photovoltaic effect) via devices called solar cells has already become an established frontier area of science and technology. Born out of necessity for remote area applications, the first commercially manufactured solar cells - single-crystal silicon and thin film CdS/Cu2S - were available well over 20 years ago. Indeed, all space vehicles today are powered by silicon solar cells. But large-scale terrestrial applications of solar cells still await major breakthroughs in terms of discovering new and radical concepts in solar cell device structures, utilizing relatively more abundant, cheap, and even exotic materials, and inventing simpler and less energy intensive fabrication processes. No doubt, this extraordinary challenge in R/D has led to a virtual explosion of activities in the field of photovoltaics in the last several years.

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Author: Y. Pauleau

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 372

ISBN-13: 940100353X

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An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Influence of strain on the functionality of ink-jet printed thin films and devices on flexible substrates
Influence of strain on the functionality of ink-jet printed thin films and devices on flexible substrates

Author: Mishra, Nilesha

Publisher: KIT Scientific Publishing

Published: 2019-02-15

Total Pages: 156

ISBN-13: 3731508532

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Ink-jet printed devices on the flexible substrate are inexpensive and large area compatible as compared to rigid substrates. However, during fabrication and service they are subjected to complex strains, resulting in crack formation or delamination within the layers, affecting the device performance. Therefore, it is necessary to understand their failure mechanisms by correlating their electrical or structural properties with applied strain, supported by detailed microstructural investigations.

Introduction to System Design Using Integrated Circuits
Introduction to System Design Using Integrated Circuits

Author: B. S. Sonde

Publisher: New Age International

Published: 1992

Total Pages: 324

ISBN-13: 9788122403862

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Beginning With An Introduction To Integrated Electronics, The Book Describes The Basic Digital And Linear Ics In Detail Together With Some Applications And Building Blocks Of Digital Systems. Principles Of System Design Using Ics Are Then Explained And A Number Of System Design Examples Using The Latest Ics Are Worked Out. Useful Supplementary Information On Ics Is Included In The Appendices And A List Of References To Published Work Is Given At The End. The Book Covers What Is Latest In The State-Of-The-Art In Ics Including Ls T Tl, F Ttl, N-Mos, High-Speed Cmos, I2L, Ccds, Proms, Plas, Asics And Microprocessors. The Main Emphasis Here Is On Providing A Clear Insight Into The Characteristics And Limitations Of Ics Upto Lsi/Vlsi Level, Their Parameters, Circuit Features And Electronic Equipment/System Design Based On Them. Students Of The B.E./M.E./M.Sc (Physics) Courses Specializing In Electronics Or Communication Engineering Would Find This Book A Convenient Text/Reference Source For A First In-Depth Understanding Of System Design Using Ics. The Book Would Also Be Useful To R&D Engineers In Electronics/Communication Engineering.