A Study of Reactive Ion Etching of Gallium Arsenide in Mixtures of Methane and Hydrogen Plasmas
Author: Hossein Fariborz Sahafi
Publisher:
Published: 1992
Total Pages:
ISBN-13:
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Author: Hossein Fariborz Sahafi
Publisher:
Published: 1992
Total Pages:
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DOWNLOAD EBOOKAuthor: Reza Ghodssi
Publisher: Springer Science & Business Media
Published: 2011-03-18
Total Pages: 1211
ISBN-13: 0387473181
DOWNLOAD EBOOKMEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.
Author: Dinesh C. Gupta
Publisher: ASTM International
Published: 1989
Total Pages: 472
ISBN-13: 0803112734
DOWNLOAD EBOOKAuthor: Hakki Ufuk Alpay
Publisher:
Published: 1984
Total Pages: 108
ISBN-13:
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Publisher:
Published: 1961
Total Pages: 496
ISBN-13:
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Publisher:
Published: 1996
Total Pages: 15
ISBN-13:
DOWNLOAD EBOOKMagnetron reactive ion etching of GaAs and AlGaAs has been investigated in CH4/H2/Ar gas mixtures. Etch rate was determined as a function of gas composition, power density (0.4-1.0W/cm2), pressure (6-25 mTorr), and total flow rate (20-40 sccm). Hydrogen passivation effects of etched and rapid thermal annealed GaAs were studied for several anneal temperatures (3000C, 4000C).
Author: R.J. Shul
Publisher: Springer Science & Business Media
Published: 2011-06-28
Total Pages: 664
ISBN-13: 3642569897
DOWNLOAD EBOOKPattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author:
Publisher:
Published: 1990
Total Pages: 392
ISBN-13:
DOWNLOAD EBOOKAuthor: Karen Jean Nordheden
Publisher:
Published: 1988
Total Pages: 106
ISBN-13:
DOWNLOAD EBOOKAuthor: William Harris Guggina
Publisher:
Published: 1991
Total Pages: 92
ISBN-13:
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