A Complete Course Of Lithography
Author: Alois Senefelder
Publisher:
Published: 1819
Total Pages: 416
ISBN-13:
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A complete course of lithography, tr. by A.S.
Author: Johann Nepomuk F. Alois Senefelder
Publisher:
Published: 1819
Total Pages: 410
ISBN-13:
DOWNLOAD EBOOKThe Invention of Lithography
Author: Alois Senefelder
Publisher: DigiCat
Published: 2022-09-04
Total Pages: 242
ISBN-13:
DOWNLOAD EBOOKDigiCat Publishing presents to you this special edition of "The Invention of Lithography" by Alois Senefelder. DigiCat Publishing considers every written word to be a legacy of humankind. Every DigiCat book has been carefully reproduced for republishing in a new modern format. The books are available in print, as well as ebooks. DigiCat hopes you will treat this work with the acknowledgment and passion it deserves as a classic of world literature.
Fundamental Principles of Optical Lithography
Author: Chris Mack
Publisher: John Wiley & Sons
Published: 2011-08-10
Total Pages: 503
ISBN-13: 1119965071
DOWNLOAD EBOOKThe fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Chemistry and Lithography
Author: Uzodinma Okoroanyanwu
Publisher: SPIE Press
Published: 2011-03-08
Total Pages: 0
ISBN-13: 9781118030028
DOWNLOAD EBOOKChemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Field Guide to Optical Lithography
Author: Chris A. Mack
Publisher: Society of Photo Optical
Published: 2006
Total Pages: 122
ISBN-13: 9780819462077
DOWNLOAD EBOOKThis Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Advanced Processes for 193-nm Immersion Lithography
Author: Yayi Wei
Publisher: SPIE Press
Published: 2009
Total Pages: 338
ISBN-13: 0819475572
DOWNLOAD EBOOKThis book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Optical Lithography
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
Published: 2021
Total Pages: 0
ISBN-13: 9781510639959
DOWNLOAD EBOOKThis book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Principles of Lithography
Author: Harry J. Levinson
Publisher: SPIE Press
Published: 2005
Total Pages: 446
ISBN-13: 9780819456601
DOWNLOAD EBOOKLithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Lithography Process Control
Author: Harry J. Levinson
Publisher: SPIE Press
Published: 1999
Total Pages: 210
ISBN-13: 9780819430526
DOWNLOAD EBOOKThis text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
