1965 Transactions of the Third International Vacuum Congress
1965 Transactions of the Third International Vacuum Congress

Author: H. Adam

Publisher: Elsevier

Published: 2016-04-16

Total Pages: 182

ISBN-13: 1483164896

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1965 Transactions of the Third International Vacuum Congress, Volume 1: Invited Papers is the first of two-volumes that review the state of knowledge in vacuum technology. The present volume comprises the opening address by Prof Auwárter and the twelve comprehensive main lectures. In keeping with the purpose of an international congress, the organizers took great pains to ensure that the choice of topics for the main lectures not only covered the scientific fundamentals as a whole, but also gave appropriate consideration to the technical applications. An analysis of the submitted topics shows that the strong points of research and development lie in the fields of ""Coating and Thin Layers"", ""Adsorption and Desorption,"" and ""Pressure Measurement and Leak Detection"". In the fields of application, ""Vacuum Metallurgy"" ranks highly. The papers published in the transactions originate from many European and overseas countries, proof that vacuum science is not only keenly pursued in all major industrial countries, but also that the new organizational form of the IUVSTA is capable of winning the services of all these countries for fruitful international cooperation in the vacuum field.

A Review: Ultrahigh-Vacuum Technology for Electron Microscopes
A Review: Ultrahigh-Vacuum Technology for Electron Microscopes

Author: Nagamitsu Yoshimura

Publisher: Academic Press

Published: 2020-02-15

Total Pages: 575

ISBN-13: 012819703X

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A Review: Ultrahigh-Vacuum Technology for Electron Microscopes provides information on the fundamentals of ultra-high vacuum systems. It covers the very subtle process that can help increase pressure inside the microscope (or inside any other ultra-high vacuum system) and the different behavior of the molecules contributing to this kind of process. Prof Yoshimura's book offers detailed information on electron microscope components, as well as UHV technology. This book is an ideal resource for industrial microscopists, engineers and scientists responsible for the design, operation and maintenance of electron microscopes. In addition, engineering students or engineers working with electron microscopes will find it useful. - Teaches how to incorporate diffusion pumps for UHV electron microscopy - Presents the work of an author who brings a lifetime of experience working on vacuum technology and electron microscopes

Sessions 9—13
Sessions 9—13

Author: H. Adam

Publisher: Elsevier

Published: 2013-10-22

Total Pages: 235

ISBN-13: 1483186059

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Sessions 9-13 discusses subjects in the field of cryogenics, vacuum metallurgy, sputtering, gettering, adsorption, desorption, and space simulation. The development and functional description of a cryo pump is covered in the first section of the book. The second section covers the measurement of the pumping speed of a cryo surface cooled with liquid nitrogen. The third topic is the examination of the cryo-getter pump. The van Arkel method is the transformation of a crude metal to a halogen compound. This method is broadly covered in the volume. A section of the text focuses on the production of copper castings of great purity. Another section described the new developments in electron beam welding under vacuum. Triode sputtering is then discussed in detail. The heat of chemisorption of carbon monoxide on polycrystalline nickel is carefully investigated. This is followed by a description of the xenon collector. The book can provide valuable insights to physicists, chemists, engineers, students, and researchers.

High-Vacuum Technology
High-Vacuum Technology

Author: Marsbed H. Hablanian

Publisher: Routledge

Published: 2017-11-13

Total Pages: 568

ISBN-13: 1351440691

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Offering a basic understanding of each important topic in vacuum science and technology, this book concentrates on pumping issues, emphasizes the behavior of vacuum pumps and vacuum systems, and explains the relationships between pumps, instrumentation and high-vacuum system performance. The book delineates the technical and theoretical aspects of the subject without getting in too deep. It leads readers through the subtleties of vacuum technology without using a dissertation on mathematics to get them there. An interesting blend of easy-to-understand technician-level information combined with engineering data and formulae, the book provides a non-analytical introduction to high vacuum technology.

Developments in Applied Spectroscopy
Developments in Applied Spectroscopy

Author: E. L. Grove

Publisher: Springer Science & Business Media

Published: 2013-11-11

Total Pages: 339

ISBN-13: 1468487000

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Volume 7 of Developments in Applied Spectroscopy is a collection of forty-two papers selected from those that were presented at the 7th National Meeting of the Society of Applied Spectroscopy, held (in place of the 19th Mid-America Symposium on Spectroscopy) in Chicago, May 13-17, 1968. These papers, selected by the editors and reviewed by persons knowledgeable in the field, are those of the symposium type and not those pertaining to specific research topics that one would expect to be submitted to a journal. It is the opinion of the committee that this type of publication has an important place in the literature. The relatively large number of papers would result in quite a sizable volume if bound in one set of covers. For this reason, and to present the material in areas of more specific mterest, Volume 7 was divided into two parts, Part A, Physical-Inorganic, and Part B, Physical-Organic Developments. The 7th National Meeting was sponsored by the Chicago Section as host in cooperation with the St. Louis, New England, Penn York, Niagara-Frontier, Cincinnati, Ohio Valley, New York, Baltimore-Washington, North Texas, Rocky Mountain, and Southeastern Sections of the Society for Applied Spectroscopy and the Chicago Gas Chromatography Group. The editors wish to express their appreciation to the authors and to those who helped with the reviewing. The latter include Dr. Elma Lanterman, Mr. John E. Forrette, Dr. Carl Moore, Dr. B. Jaselskis, Mr. H. G. Zelinski, Mr.

Chemisorption And Reactions On Metallic Films V1
Chemisorption And Reactions On Metallic Films V1

Author: J Anderson

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 568

ISBN-13: 0323145698

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Chemisorption and Reactions on Metallic Films, Volume 1 is a six-chapter text that describes the role of evaporated metal films in advancing the understanding of the metal-gas interface chemistry. Chapter 1 presents electron microscopy and diffraction studies and their contributions in elucidating the growth and structure of polycrystalline and epitaxially grown films. Chapter 2 describes the techniques of preparation and characterization of metallic films and examines the heats of adsorption, electrical conductivity, surface area, and sticking probabilities of such films. Chapter 3 discusses the strength of pairwise interactions; the influence of the intermetallic bond on the equilibrium shape of metal crystallites; the bonding of individual metal atoms to different crystallographic planes; the interaction of metal atoms and crystallites with non-conducting substrates; and the effects of residual gases on this interaction. Chapters 4 and 5 address the adsorption of metallic films, with an emphasis on general trends in adsorptive and electronic properties of bulk metals. These chapters also discuss the effects of adsorption on the electrical conductance of island-like and coherent films and on the ferromagnetic properties of films. Chapter 6 evaluates the application of infrared spectroscopy to the studies of the surfaces of metal films and the use of the available infrared spectroscopic data in reconciling the results of adsorption studies on oxide-supported metal particles with those obtained with clean evaporated metal films prepared under ultra high vacuum conditions. Research scientists and graduate students who are interested in the fundamentals of adsorption and catalysis will find this volume invaluable.

Thin-Film Optical Filters
Thin-Film Optical Filters

Author: H. Angus Macleod

Publisher: CRC Press

Published: 2017-12-15

Total Pages: 664

ISBN-13: 1351982249

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Praise for prior editions "an excellent treatise of thin film coatings, explaining how to produce all sorts of different filters selected according to the function they are required to play... an indispensable text for every filter manufacturer and user and an excellent guide for students." ―Contemporary Physics "essential reading for all those involved in the design, manufacture, and application of optical coatings" ―Materials World "a must-have addition to the library of any optical thin-film theorist or practitioner" ―SVC News This book is quite simply the Bible for the field of optical thin films. It gives the most complete introduction to thin film optical coatings addressed to manufacturers and users alike. This fifth edition offers a complete update on current design, manufacture, performance, and applications. New topics include absorbers and coherent perfect absorbers, photonic crystals, and metamaterials for optical coating. The author has also made substantial additions on scattering, composite materials, wire grid polarizers, laser damage, and applications. H. Angus Macleod is President of Thin Film Center Inc., in Tucson, Arizona, and Professor Emeritus of Optical Sciences Center at the University of Arizona. His professional honors include a Gold Medal from SPIE, the Esther Hoffman Beller Medal from the Optical Society of America, and the Nathaniel H. Sugerman Memorial Award from the Society of Vacuum Coaters.