Fundamentals of Semiconductor Manufacturing and Process Control
Fundamentals of Semiconductor Manufacturing and Process Control

Author: Gary S. May

Publisher: John Wiley & Sons

Published: 2006-05-26

Total Pages: 428

ISBN-13: 0471790273

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A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.

Intelligent Modeling, Diagnosis and Control of Manufacturing Processes
Intelligent Modeling, Diagnosis and Control of Manufacturing Processes

Author: Bei-Tseng Bill Chu

Publisher: World Scientific Publishing Company Incorporated

Published: 1992

Total Pages: 263

ISBN-13: 9789810208172

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1. Manufacturing diagnosis and control: a task-specific approach / W.F. Punch III, A.K. Goel and J. Sticklen -- 2. The theory and application of diagnostic and control expert system based on plant model / J. Suzuki and M. Iwamasa -- 3. Integrated problem solving for the diagnosis of interacting process malfunctions / J.K. McDowell and J.F. Davis -- 4. A neural network model for diagnostic problem solving / Y. Peng and J.A. Reggia -- 5. Process control system for VLSI fabrication / E. Sachs [und weitere] -- 6. Development and application of equipment-specific process models for semiconductor manufacturing / K.-K. Lin and C. Spanos -- 7. Continuous equipment diagnosis using evidence integration - an LPCVD application / N.H. Chang, and C. Spanos -- 8. Equipment/instrument diagnosis with continuous and discrete causal relationships / B.-T.B. Chu -- 9. Intelligent control of semiconductor manufacturing processes / S.-S. Chen -- 10. A machine learning approach to diagnosis and control with applications in semiconductor manufacturing / K.B. Irani [und weitere]

Plasma Processing of Semiconductors
Plasma Processing of Semiconductors

Author: P.F. Williams

Publisher: Springer Science & Business Media

Published: 2013-11-11

Total Pages: 610

ISBN-13: 9401158843

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Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.

Microelectronics Manufacturing Diagnostics Handbook
Microelectronics Manufacturing Diagnostics Handbook

Author: Abraham Landzberg

Publisher: Springer Science & Business Media

Published: 2012-12-06

Total Pages: 663

ISBN-13: 1461520290

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The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.

Chemical Mechanical Polishing in Silicon Processing
Chemical Mechanical Polishing in Silicon Processing

Author:

Publisher: Academic Press

Published: 1999-10-29

Total Pages: 325

ISBN-13: 0080864619

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Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry.